Single Phase Fluid Imprint Lithography Method
First Claim
1. A method for reducing gases present in a layer of viscous liquid positioned on a substrate, said method comprising:
- varying a transport of gases proximate to said viscous liquid to increase said transport of said gases through either said viscous liquid, said substrate, a mold assembly spaced-apart from said substrate, or a combination thereof.
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Accused Products
Abstract
The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to either the viscous liquid, the substrate, the template, or a combination thereof. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
125 Citations
24 Claims
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1. A method for reducing gases present in a layer of viscous liquid positioned on a substrate, said method comprising:
varying a transport of gases proximate to said viscous liquid to increase said transport of said gases through either said viscous liquid, said substrate, a mold assembly spaced-apart from said substrate, or a combination thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for reducing gases present in viscous liquid positioned on a substrate, said method comprising:
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defining a processing region proximate to said substrate by placing a mold assembly in close proximity with said viscous liquid, said processing region having an atmosphere associated therewith; and varying characteristics of said atmosphere to increase a transport of gases in said atmosphere, with said transport of said gases being through either said mold assembly, said substrate, said liquid, or a combination thereof. - View Dependent Claims (9, 10, 11, 12, 13)
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14. A method for reducing gases present in a layer of viscous liquid positioned on a substrate, said method comprising:
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placing a mold assembly in close proximity with said substrate, defining a processing region therebetween having an atmosphere associated therewith; introducing a fluid into said atmosphere to increase a transport of said gases in either said viscous liquid, said mold assembly, said substrate, or a combination thereof; and reducing a pressure of said processing region by applying a vacuum to said processing region. - View Dependent Claims (15, 16)
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17. A method for reducing gases present in a layer of viscous liquid deposited on a substrate, said method comprising:
varying a composition of gases proximate to said viscous liquid to increase transport of said gases in either said viscous liquid, said substrate, a mold assembly spaced-apart from said substrate, or a combination thereof. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
Specification