Showerhead electrode assembly with gas flow modification for extended electrode life
1 Assignment
0 Petitions
Accused Products
Abstract
A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.
-
Citations
44 Claims
-
1-24. -24. (canceled)
-
25. A showerhead electrode assembly for a plasma processing apparatus, comprising:
-
an electrode having a plurality of first gas passages, the electrode having a plasma-exposed surface; a backing member attached to the electrode and having a plurality of second gas passages in fluid communication with the first gas passages; one or more first plenums formed in the backing member and in fluid communication with the second gas passages; wherein when a process gas is flowed through the first and second gas passages a total pressure drop is generated across the first and second gas passages, a fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages. - View Dependent Claims (26, 27, 28, 29, 30)
-
-
31. A showerhead electrode assembly for a plasma processing apparatus, comprising:
-
a silicon electrode with a plasma-exposed surface, the electrode having a plurality of axially extending first gas passages; a metallic backing member attached to the electrode and having a plurality of axially extending second gas passages in fluid communication with the first gas passages; one or more first plenums formed in the metallic backing member and in fluid communication with the second gas passages; wherein when a process gas is flowed through the first and second gas passages a total pressure drop is generated across the first and second gas passages, a fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39, 40, 41)
-
-
42. A showerhead electrode assembly for a plasma processing apparatus, comprising:
-
a first member having a plurality of first gas passages having a first portion and second portion wider than the first portion, the first member having a plasma-exposed surface, wherein the second portion is adjacent to the plasma-exposed surface; a second member attached to the first surface of the first member, the second member having a plurality of second gas passages in fluid communication with the first gas passages, wherein when a process gas is flowed through the first and second gas passages, a total pressure drop is generated across the first and second portions of the first gas passages, a fraction of the total pressure drop across the second portion is greater than a fraction of the total pressure drop across the first portion. - View Dependent Claims (43, 44)
-
Specification