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Thin film transistor, thin film transistor substate, and method of manufacturing the same

  • US 20080142797A1
  • Filed: 12/06/2007
  • Published: 06/19/2008
  • Est. Priority Date: 12/14/2006
  • Status: Active Grant
First Claim
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1. A method of manufacturing a thin film transistor substrate, comprising:

  • forming on a surface of a substrate a first conductive pattern group including a gate line, a gate electrode, and a gate pad electrode;

    forming a gate insulating layer on the surface of the substrate on which the first conductive pattern group is formed;

    forming on the gate insulating layer an oxide semiconductor pattern overlapping the gate electrode; and

    forming first and second conductive layers on the surface of the substrate on which the oxide semiconductor pattern is formed and patterning the first and second conductive layers to form a second conductive pattern group including a data line, a source electrode, a drain electrode, and a data pad.

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