Thin film transistor, thin film transistor substate, and method of manufacturing the same
First Claim
1. A method of manufacturing a thin film transistor substrate, comprising:
- forming on a surface of a substrate a first conductive pattern group including a gate line, a gate electrode, and a gate pad electrode;
forming a gate insulating layer on the surface of the substrate on which the first conductive pattern group is formed;
forming on the gate insulating layer an oxide semiconductor pattern overlapping the gate electrode; and
forming first and second conductive layers on the surface of the substrate on which the oxide semiconductor pattern is formed and patterning the first and second conductive layers to form a second conductive pattern group including a data line, a source electrode, a drain electrode, and a data pad.
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Abstract
A thin film transistor substrate and a method of manufacturing the same are disclosed. The method of manufacturing a thin film transistor substrate includes forming a first conductive pattern group including a gate line, a gate electrode, and a lower gate pad electrode on a substrate, forming a gate insulating layer on the substrate on which the first conductive pattern group is formed, forming an oxide semiconductor pattern overlapping the gate electrode on the gate insulating layer, and forming first and second conductive layers on the substrate on which the oxide semiconductor pattern is formed and patterning the first and second conductive layers to form a second conductive pattern group including a data line, a source electrode, a drain electrode, and a data pad.
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Citations
20 Claims
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1. A method of manufacturing a thin film transistor substrate, comprising:
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forming on a surface of a substrate a first conductive pattern group including a gate line, a gate electrode, and a gate pad electrode; forming a gate insulating layer on the surface of the substrate on which the first conductive pattern group is formed; forming on the gate insulating layer an oxide semiconductor pattern overlapping the gate electrode; and forming first and second conductive layers on the surface of the substrate on which the oxide semiconductor pattern is formed and patterning the first and second conductive layers to form a second conductive pattern group including a data line, a source electrode, a drain electrode, and a data pad. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A thin film transistor substrate comprising:
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a gate line and a gate electrode formed on a substrate; a gate insulating layer formed on the gate line and the gate electrode; an oxide semiconductor layer overlapping the gate electrode on the gate insulating layer; a data line, a source electrode, and a drain electrode formed of first and second conductive layers on the oxide semiconductor layer and the gate insulating layer; and a pixel electrode connected to the drain electrode and formed of the first conductive layer. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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19. A thin film transistor comprising:
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a gate electrode; a gate insulating layer formed on the gate electrode; an oxide semiconductor layer overlapping the gate electrode on the gate insulating layer; and a source electrode and a drain electrode formed of first and second conductive layers on the oxide semiconductor layer. - View Dependent Claims (20)
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Specification