AMPOULE WITH A THERMALLY CONDUCTIVE COATING
First Claim
1. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
- a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein;
an adhesion layer disposed over an outside surface of the canister;
a thermally conductive coating disposed over the adhesion layer; and
an inlet port and an outlet port in fluid communication with the interior volume.
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Accused Products
Abstract
Embodiments of the invention provide an apparatus and a process for generating a chemical precursor used in a vapor deposition processing system. The apparatus includes a canister (e.g., ampoule) having a sidewall, a top, and a bottom encompassing an interior volume therein, inlet and outlet ports in fluid communication with the interior volume, and a thermally conductive coating disposed on or over the outside surface of the canister. The thermally conductive coating is more thermally conductive than the outside surface of the canister. The thermally conductive coating may contain aluminum, aluminum nitride, copper, brass, silver, titanium, silicon nitride, or alloys thereof. In some embodiments, an adhesion layer (e.g., titanium or tantalum) may be disposed between the outside surface of the canister and the thermally conductive coating. In other embodiments, the canister may contain a plurality of baffles or solid heat-transfer particles to help evenly heat a solid precursor therein.
503 Citations
30 Claims
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1. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
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a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein; an adhesion layer disposed over an outside surface of the canister; a thermally conductive coating disposed over the adhesion layer; and an inlet port and an outlet port in fluid communication with the interior volume. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
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a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein; a thermally conductive coating disposed over an outside surface of the canister; an inlet port and an outlet port in fluid communication with the interior volume; and a plurality of baffles extending from the bottom and forming an extended mean flow path between the inlet port and the outlet port within the interior volume of the canister. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
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a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein; an adhesion layer comprising titanium or tantalum disposed over the outside surface of the canister; a thermally conductive coating disposed over the adhesion layer; and an inlet port and an outlet port in fluid communication with the interior volume. - View Dependent Claims (23, 24, 25, 26)
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27. An apparatus for generating a chemical precursor used in a vapor deposition processing system, comprising:
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a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein; an adhesion layer disposed over the outside surface of the canister; a thermally conductive coating disposed over the adhesion layer, wherein the thermally conductive coating comprises a material selected from the group consisting of aluminum, aluminum nitride, copper, brass, silver, titanium, silicon nitride, alloys thereof, and combinations thereof; and an inlet port and an outlet port in fluid communication with the interior volume. - View Dependent Claims (28, 29, 30)
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Specification