Compensation Techniques for Fluid and Magnetic Bearings
First Claim
1. A system, comprising:
- one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices;
a guide passing through respective ones of the openings;
fluid or magnetic bearings configured to guide the respective support devices along the guides; and
a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings, the compensation system being configured to compensate for any non-straight areas of the guides or shifting of the support devices, which is done through moving of the support devices traverse to the guides during movement of the support devices along the guides.
1 Assignment
0 Petitions
Accused Products
Abstract
A system if used to compensate for guide flatness errors and/or shifting of a support. The system comprises one or more of the supports, an actuating system, the guide, a fluid or magnetic bearing, and a compensation system. The one or more support devices have one or more openings. The support devices are coupled to the actuating system, which is configured to move the support devices. The guide passes through respective ones of the openings. The fluid or magnetic bearings are configured to guide the respective support devices along the guides. The compensation system is coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings. The compensation system is configured to compensate for any non-straight areas of the guides or shifting (e.g., thermal shifting) of the support devices, which is done through moving of the support devices with respect to the guides during movement of the support devices along the guides. Additionally, or alternatively, the compensation system is configured to generate a rotational motion that compensates for any tilting of the support devices during movement of the support devices along the guide.
-
Citations
46 Claims
-
1. A system, comprising:
-
one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices; a guide passing through respective ones of the openings; fluid or magnetic bearings configured to guide the respective support devices along the guides; and a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings, the compensation system being configured to compensate for any non-straight areas of the guides or shifting of the support devices, which is done through moving of the support devices traverse to the guides during movement of the support devices along the guides. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
-
-
23. An illumination system of a lithography apparatus, comprising:
-
one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices; a guide passing through respective ones of the openings; fluid or magnetic bearings configured to guide the respective support devices along the guides; and a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings, the compensation system being configured to compensate for any non-straight areas of the guides or shifting of the support devices, which is done through moving of the support devices traverse to the guides during movement of the support devices along the guides.
-
-
24. A system, comprising:
-
one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices; a guide passing through respective ones of the openings; fluid or magnetic bearings configured to guide the respective support devices along the guides; and a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings and configured to generate a rotational motion that compensates for any tilting of the support devices during movement of the support devices along the guide. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32)
-
-
33. An illumination system of a lithography apparatus, comprising:
-
one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices; a guide passing through respective ones of the openings; fluid or magnetic bearings configured to guide the respective support devices along the guides; and a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings and configured to generate a rotational motion that compensates for any tilting of the support devices during movement of the support devices along the guide. - View Dependent Claims (34, 35, 36, 37, 38, 39)
-
-
40. A lithography apparatus, comprising:
-
an illumination system configured to produce a beam of radiation; a patterning device configured to pattern the beam of radiation; and a projection system configured to project the patterned beam onto a target portion of a substrate, wherein the illumination system comprises; one or more support devices having one or more openings, the support devices being coupled to an actuating system that moves the support devices; a guide passing through respective ones of the openings; fluid or magnetic bearings configured to guide the respective support devices along the guides; and a compensation system coupled to respective ones of the support devices adjacent each of the fluid or magnetic bearings and configured to generate a rotational motion that compensates for any tilting of the support devices during movement of the support devices along the guide. - View Dependent Claims (41, 42, 43, 44, 45, 46)
-
Specification