RF semiconductor devices and methods for fabricating the same
First Claim
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1. A RF semiconductor device comprising:
- a substrate;
first and second trenches defining an active region and at least one isolation region in the substrate, the first and second trenches being located on opposite sides of the active region, each of the first and second trenches having a longitudinal axis; and
a plurality of gate lines formed in the active region and oriented substantially perpendicularly to the longitudinal axes of the first and second trenches, wherein the gate lines do not extend along the longitudinal axes of the first and second trenches.
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Abstract
RF semiconductor devices and methods of making the same are disclosed. In a disclosed method, a trench for defining an active region and an element isolation region is formed in a semiconductor substrate. One or more gate lines is then formed within the active region. Next, an insulating layer is formed on the semiconductor substrate and the gate lines. Contact holes are then formed in the insulating layer. Contact plugs are then formed in the contact holes. Thereafter, a conductive pattern is electrically connected with the contact plugs.
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Citations
20 Claims
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1. A RF semiconductor device comprising:
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a substrate; first and second trenches defining an active region and at least one isolation region in the substrate, the first and second trenches being located on opposite sides of the active region, each of the first and second trenches having a longitudinal axis; and a plurality of gate lines formed in the active region and oriented substantially perpendicularly to the longitudinal axes of the first and second trenches, wherein the gate lines do not extend along the longitudinal axes of the first and second trenches. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A RF semiconductor device comprising:
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a substrate; first and second trenches defining an active region and at least one isolating region in the substrate, the first and second trenches being located on opposite sides of the active region; and at least two gate lines extending across the active region from the first trench to the second trench without passing above a center of either of the first and second trenches. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification