METHOD OF MANUFACTURING OPTICAL INTERFERENCE COLOR DISPLAY
First Claim
1. A method of fabricating an optical interference color display, comprising:
- providing a substrate, and forming a first electrode structure over the substrate;
defining a first area, a second area, and a third area on the first electrode structure;
forming a first sacrificial layer over the first electrode structure of the first area;
forming a second sacrificial layer over the first electrode structure of the second area;
forming a third sacrificial layer over the first electrode structure of the third area, wherein the first sacrificial layer, the second sacrificial layer and the third sacrificial layer having different etching rates and thicknesses;
forming a patterned support layer over the first electrode structure;
forming a second electrode layer over the first sacrificial layer inside the first area, the second sacrificial layer inside the second area, the third sacrificial layer inside the third area and a portion of the patterned support layer; and
removing the first sacrificial layer, the second sacrificial layer and the third sacrificial layer to form a plurality of air gaps between the first electrode structure and the second electrode layer.
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Abstract
The method of manufacturing an optical interference color display is described. A first electrode structure is formed over a substrate first. At least one first area, second area and third area are defined on the first electrode structure. A first sacrificial layer is formed over the first electrode structure of the first area, the second area and the third area. Moreover, a second sacrificial layer is formed over the first sacrificial layer inside the second area and the third area. In addition, a third sacrificial layer is formed over the second sacrificial layer inside the third area. The etching rates of all sacrificial layers are different. Then, a patterned support layer is formed over the first electrode structure. Next, a second electrode layer is formed and the sacrificial layers are removed to form air gaps. Therefore, the air gaps are effectively controlled by using the material having different etching rates.
114 Citations
13 Claims
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1. A method of fabricating an optical interference color display, comprising:
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providing a substrate, and forming a first electrode structure over the substrate; defining a first area, a second area, and a third area on the first electrode structure; forming a first sacrificial layer over the first electrode structure of the first area; forming a second sacrificial layer over the first electrode structure of the second area; forming a third sacrificial layer over the first electrode structure of the third area, wherein the first sacrificial layer, the second sacrificial layer and the third sacrificial layer having different etching rates and thicknesses; forming a patterned support layer over the first electrode structure; forming a second electrode layer over the first sacrificial layer inside the first area, the second sacrificial layer inside the second area, the third sacrificial layer inside the third area and a portion of the patterned support layer; and removing the first sacrificial layer, the second sacrificial layer and the third sacrificial layer to form a plurality of air gaps between the first electrode structure and the second electrode layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of fabricating an optical interference color display, comprising:
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providing a substrate, and forming a first electrode structure over the substrate; defining a first area and a second area on the first electrode structure; forming a first sacrificial layer over the first electrode structure of the first area; forming a second sacrificial layer over the first electrode structure of the second area, the first sacrificial layer and the second sacrificial layer having different etching rates and thicknesses; forming a patterned support layer over the first electrode structure; forming a second electrode layer over the first sacrificial layer inside the first area, the second sacrificial layer inside the second area and a portion of the patterned support layer; and removing the first sacrificial layer and the second sacrificial layer to form a plurality of air gaps between the first electrode structure and the second electrode layer.
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Specification