LIQUID CRYSTAL DISPLAY PANEL AND MANUFACTURING METHOD OF THE SAME
First Claim
1. A fringe field type liquid crystal display panel, comprising:
- a gate line disposed on a substrate;
a data line disposed to cross the gate line, wherein a gate insulate is disposed between the gate line and the date line;
a thin film transistor disposed at an intersection area of the gate line and the data line;
a pixel electrode disposed on the gate insulating film and directly connected to the thin film transistor;
a passivation film disposed on the gate insulating film to cover the pixel electrode and the thin film transistor; and
a common electrode disposed to overlap the pixel electrode and the data line on the passivation film to form a fringe field for aligning liquid crystal together with the pixel electrode.
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Accused Products
Abstract
A fringe field type liquid crystal display panel that increases an aperture ratio of a pixel area includes: a gate line disposed on a substrate; a data line disposed to cross the gate line, wherein a gate insulating film is disposed the gate line and the data line; a thin film transistor disposed at an intersection area of the gate line and the data line; a pixel electrode disposed on the gate insulating film and directly connected to the thin film transistor; a passivation film disposed on the gate insulating film to cover the pixel electrode and the thin film transistor; and a common electrode disposed to overlap the pixel electrode and the data line on the passivation film to form a fringe field for aligning liquid crystal together with the pixel electrode.
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Citations
45 Claims
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1. A fringe field type liquid crystal display panel, comprising:
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a gate line disposed on a substrate; a data line disposed to cross the gate line, wherein a gate insulate is disposed between the gate line and the date line; a thin film transistor disposed at an intersection area of the gate line and the data line; a pixel electrode disposed on the gate insulating film and directly connected to the thin film transistor; a passivation film disposed on the gate insulating film to cover the pixel electrode and the thin film transistor; and a common electrode disposed to overlap the pixel electrode and the data line on the passivation film to form a fringe field for aligning liquid crystal together with the pixel electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A fabricating method of a fringe field type liquid crystal display panel, comprising the steps of:
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forming a gate line on a substrate; forming a data line which crosses the gate line to define a pixel area, wherein a gate insulating film is disposed between the gate line and the data line; forming a thin film transistor at an intersection area of the gate line and the data line; forming a pixel electrode on the gate insulating film to be directly connected to the thin film transistor; forming a passivation film on the gate insulating film to cover the pixel electrode and the thin film transistor; and forming a common electrode to overlap the pixel electrode and the data line on the passivation film and to form a fringe field for aligning liquid crystal together with the pixel electrode. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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33. A fabricating method of a fringe field type liquid crystal display panel, comprising the steps of:
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forming a first conductive pattern having a gate line, a gate electrode and a gate pad lower electrode, which are connected to the gate line, and the storage electrode on a substrate; forming a gate insulating film which covers the substrate where the first conductive pattern is formed; forming a pixel electrode which forms a fringe field on the gate insulating film; forming a semiconductor layer comprising an ohmic contact layer and an active layer, which forms a channel, on the gate insulating film where the pixel electrode is formed; forming a second conductive pattern having a data line, which crosses the gate line on the gate insulating film to define a pixel area, a source electrode connected to the data line, a drain electrode formed to face the source electrode with a channel therebetween, and a data pad lower electrode, and a semiconductor pattern having the ohmic contact layer and the active layer which forms the channel; forming a passivation film to cover the insulating film where the semiconductor pattern and the second conductive pattern are formed; and forming a common electrode to overlap the pixel electrode and the data line on the passivation film and to form a fringe field. - View Dependent Claims (34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
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Specification