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APPARATUS AND METHOD FOR CONFORMAL MASK MANUFACTURING

  • US 20080160431A1
  • Filed: 11/21/2007
  • Published: 07/03/2008
  • Est. Priority Date: 11/22/2006
  • Status: Active Grant
First Claim
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1. A method for processing comprising:

  • providing a workpiece comprising a layer that is configured to be patterned by a particle beam and a first transfer layer thereunder, the particle beam patternable layer being thinner than the first transfer layer; and

    exposing regions of the particle beam patternable layer using a collimated beam of spatially and temporally resolved charged particles thereby changing said regions;

    wherein the first transfer layer is configured to be selectively processed relative to the particle beam patternable layer using a first removal process that removes regions of the first transfer layer having a shape substantially determined by the shape of the exposed regions of the particle beam patternable layer.

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