METHOD OF MODIFYING A SURFACE AND A METHOD OF FORMING AN AREA OF A FUNCTIONAL LIQUID ON THE MODIFIED SURFACE

• US 20080160761A1
• Filed: 11/19/2007
• Published: 07/03/2008
• Est. Priority Date: 11/22/2006
• Status: Abandoned Application

• Current Assignee: Seiko Epson Corporation (Seiko Group)
• Original Assignee: Seiko Epson Corporation (Seiko Group)
• Inventors: NEWSOME, Christopher, LI, Shunpu, CHU, Daping
• Application Number:
  US11/942,369
• Publication Number:
  US 20080160761A1
• Time in Patent Office: Days
• US Class Current: 438/679
• CPC Class Codes: H01L 21/288 from a liquid, e.g. electrolytic deposition
• CPC Class Codes: H01L 21/31058 of organic layers
• CPC Class Codes: H01L 21/76826 by contacting the layer with gases, liquids or plasmas

Abstract

A method of modulating a surface includes: (a) forming a BCB layer on a surface of a target object; and (b) conducting a CF₄ plasma exposure against a top surface of the BCB layer.

Claims

1. A method of modifying a surface, the method comprising:

(a) forming a benzo-cyclo-butene layer over a portion of a target object; and

(b) conducting a CF₄ plasma exposure against a portion of the benzo-cyclo-butene layer.

2. The method according to claim 1, the portion of the target object having a first height variation, the portion of the benzo-cyclo-butene layer having a second height variation that is more flat than the first height variation.

3. The method according to claim 1, the forming the benzo-cyclo-butene layer including forming a precursor layer including benzo-cyclo-butene over the portion of the target object by spin-coating.

4. A method of forming an area of a functional liquid, the method comprising:

(a) forming a benzo-cyclo-butene layer over a portion of a target object,

(b) conducting a CF₄ plasma exposure against a portion of the benzo-cyclo-butene layer; and

(c) depositing a functional liquid over the portion of the benzo-cyclo-butene layer so as to form an area of the functional liquid over the portion of the benzo-cyclo-butene layer.

5. The method according to claim 4, the portion of the target object having a first height variation, the portion of the benzo-cyclo-butene layer having a second height variation that is more flat than the first height variation.

6. The method according to claim 4, the forming the benzo-cyclo-butene layer including forming a precursor layer including benzo-cyclo-butene over the portion of the target object by spin-coating.

7. The method according to claim 4, the forming the benzo-cyclo-butene layer including forming a precursor layer including benzo-cyclo-butene over the portion of the target object by an inkjet printing method.

8. The method according to claim 4, the area being a track.

9. The method according to claim 4, further including:

(d) evaporating the area of the functional liquid that includes a conductive material, so that a conductive area including the conductive material is formed over the portion of the benzo-cyclo-butene layer.

10. The method according to claim 4, the target object being a CMOS chip.

11. The method a according to claim 4, the portion of the benzo-cyclo-butene layer having a free format surface.