×

METHOD, SYSTEM, AND COMPUTER PROGRAM PRODUCT FOR CONCURRENT MODEL AIDED ELECTRONIC DESIGN AUTOMATION

  • US 20080162103A1
  • Filed: 10/02/2007
  • Published: 07/03/2008
  • Est. Priority Date: 12/29/2006
  • Status: Abandoned Application
First Claim
Patent Images

1. A machine-implemented method for predicting performance, manufacturability, or reliability (PMR) with concurrent model analysis, comprising:

  • identifying an electronic circuit design for an electronic circuit to be manufactured by a first manufacturing process;

    identifying a first concurrent model of the first manufacturing process for a first level of the electronic circuit;

    determining a first geometric characteristic of a first feature of the first level based upon the first concurrent model;

    determining a first metric of the first level based upon the first geometric characteristic of the first feature of the first level;

    determining whether a first PMR requirement is satisfied for the electronic circuit based upon the first geometric characteristic or the first metric; and

    displaying the first geometric characteristic of the first level or storing the first geometric characteristic in a tangible computer accessible medium.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×