Liquid Removing Apparatus, Exposure Apparatus and Device Fabricating Method

• US 20080165330A1
• Filed: 01/18/2006
• Published: 07/10/2008
• Est. Priority Date: 01/18/2005
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Mizutani, Takeyuki
• Application Number:
  US11/814,153
• Publication Number:
  US 20080165330A1
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions

Abstract

A liquid removing apparatus (1) evacuates a gas present in a specified space formed on a rear surface (Pb) side of a substrate (P) taken out from a substrate holder (PH), to remove liquid adhered to the rear surface (Pb) of an exposure target substrate (P).

Claims

1. A liquid removing apparatus that removes liquid adhered to an exposure target substrate irradiated with exposure light through the liquid and taken out from a substrate holder, wherein a specified space is formed on a rear surface side of the exposure target substrate taken out from the substrate holder and wherein the liquid adhered to a rear surface of the exposure target substrate is removed by evacuating a gas present in the specified space through a suction port.

2. The liquid removing apparatus according to claim 1, wherein a gas stream moving toward the suction port is generated in the specified space by performing evacuation of the gas through the suction port and the liquid is recovered through the suction port by moving the liquid adhered to the rear surface of the exposure target substrate to the suction port by virtue of the gas stream.

3. The liquid removing apparatus according to claim 1, wherein the specified space is connected to an external space lying outside the specified space so that the gas can flow.

4. The liquid removing apparatus according to claim 1, comprising a holder mechanism that holds the exposure target substrate so that the specified space is formed on the rear surface side of the exposure target substrate.

5. The liquid removing apparatus according to claim 1, comprising a specified member having a prescribed surface facing the rear surface of the exposure target substrate, the specified space comprising a space between the rear surface of the exposure target substrate and the prescribed surface.

6. The liquid removing apparatus according to claim 5, wherein the suction port is provided at the prescribed surface.

7. The liquid removing apparatus according to claim 5, wherein the specified space is connected to the external space lying outside the specified space through a gap between an edge region of the rear surface of the exposure target substrate and the prescribed surface of the specified member.

8. The liquid removing apparatus according to claim 6, wherein the suction port is provided in a region of the prescribed surface facing a center portion of the rear surface of the exposure target substrate held on the holder mechanism.

9. The liquid removing apparatus according to claim 5, wherein a flow path is formed on the specified member so that the gas can flow between the specified space and the external space lying outside the specified space.

10. The liquid removing apparatus according to claim 5, wherein the specified member has protruding portions provided at the prescribed surface, the protruding portions adapted to support the rear surface of the exposure target substrate to form a first gap between the rear surface of the exposure target substrate and the prescribed surface.

11. The liquid removing apparatus according to claim 10, wherein the first gap ranges from 10 μ

m to 1 mm.

12. The liquid removing apparatus according to claim 5, comprising a guide member that guides the gas stream in the specified space.

13. The liquid removing apparatus according to claim 12, wherein the guide member is adapted to guide the gas stream moving toward the suction port.

14. The liquid removing apparatus according to claim 12, wherein the guide member is provided at the prescribed surface facing the rear surface of the exposure target substrate.

15. The liquid removing apparatus according to claim 14, wherein a second gap is formed between a top surface of the guide member and the rear surface of the exposure target substrate.

16. The liquid removing apparatus according to claim 15, wherein the second gap ranges from 2 μ

m to 5 μ

m.

17. The liquid removing apparatus according to claim 12, wherein the specified space is divided into a plurality of partition spaces by the guide member, the suction port comprising a plurality of suction ports corresponding to the partition spaces, respectively.

18. The liquid removing apparatus according to claim 17, wherein the respective partition spaces are connected to the external space lying outside the partition spaces so that the gas can flow.

19. The liquid removing apparatus according to claim 17, wherein the respective partition spaces has a shape converging from the edge region of the rear surface of the exposure target substrate toward the center portion and adjoins to one another.

20. The liquid removing apparatus according to claim 19, wherein the respective partition spaces are connected near the edge region to the external space lying outside the partition spaces to allow the gas to flow through and the suction port is provided near the center portion.

21. The liquid removing apparatus according to claim 17, wherein the respective partition spaces are formed in an annular shape and arranged in a concentric pattern.

22. The liquid removing apparatus according to claim 21, wherein the suction port and the flow path communicating with the external space lying outside the partition spaces are provided in the specified space in a predetermined positional relationship.

23. The liquid removing apparatus according to claim 1, wherein the specified space is formed so that the gas can flow along the rear surface of the exposure target substrate by evacuating the gas in the specified space.

24. An exposure apparatus comprising a substrate holder and the liquid removing apparatus according to claim 1.

25. The exposure apparatus according to claim 24, comprising a conveyor system that conveys the exposure target substrate between the substrate holder and the liquid removing apparatus, wherein the conveyor system is adapted to hold a generally central portion of the rear surface of the exposure target substrate.

26. A device fabricating method comprising:

using the exposure apparatus according to claim 24.