×

Lithographic Apparatus, Device Manufacturing Method and Device

  • US 20080165332A1
  • Filed: 11/30/2007
  • Published: 07/10/2008
  • Est. Priority Date: 12/01/2006
  • Status: Active Grant
First Claim
Patent Images

1. A method of imaging overlapping patterns on a target field of a substrate, comprising:

  • providing overlay errors between the overlapping patterns, the provided overlay errors corresponding to controlling the process according to a suggested value for each of at least one process parameters of a model of the process;

    determining a value for each of the at least one process parameters corresponding to minimal overlay errors by fitting the model to data comprising the provided overlay errors and the suggested values for each of the at least one process parameters;

    creating the overlapping patterns thereby controlling the process according to the determined values for each of the at least one the process parameters; and

    creating a first part of one of the overlapping patterns according to a first determined value for each of the at least one process parameters and creating a second part of the one of the overlapping patterns according to a second determined value for each of the at least one the process parameters wherein the first value differs from the second value.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×