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MICROWAVE PLASMA APPARATUS AND METHOD FOR MATERIALS PROCESSING

  • US 20080173641A1
  • Filed: 01/17/2008
  • Published: 07/24/2008
  • Est. Priority Date: 01/18/2007
  • Status: Active Grant
First Claim
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1. A microwave plasma apparatus for processing a material comprising:

  • a plasma chamber;

    a microwave radiation source for generating microwave radiation;

    a waveguide guiding the microwave radiation from the microwave radiation source to the plasma chamber;

    a supply in fluid communication with the plasma chamber for providing a gas to the plasma chamber; and

    a material feeding system in communication with the plasma chamber for introducing a process material to the plasma chamber,wherein the microwave radiation couples to the gas to form a plasma jet, and wherein the process material, through contact with the plasma jet, forms a product material.

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