ELECTROCONDUCTIVE LAMINATE, ELECTROMAGNETIC WAVE SHIELDING FILM FOR PLASMA DISPLAY AND PROTECTIVE PLATE FOR PLASMA DISPLAY

• US 20080174872A1
• Filed: 05/30/2007
• Published: 07/24/2008
• Est. Priority Date: 05/31/2006
• Status: Abandoned Application

• Current Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Original Assignee: Asahi Glass Company, Limited (AGC, Inc.)
• Inventors: Miyazawa, Hideaki, Kawasaki, Masato, MORIMOTO, Tamotsu
• Application Number:
  US11/755,577
• Publication Number:
  US 20080174872A1
• Time in Patent Office: Days
• US Class Current: 359/585
• CPC Class Codes: G02B 1/11 Anti-reflection coatings
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: G02B 1/16 having an anti-static effect, e.g. electrically conducting coatings
• CPC Class Codes: G02B 5/208 for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
• CPC Class Codes: H01J 11/44 Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
• CPC Class Codes: H01J 2211/446 Electromagnetic shielding means; Antistatic means
• CPC Class Codes: H05K 9/0096 for television displays, e.g. plasma display panel

Abstract

An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12); the refractive index of the inorganic compound is from 1.5 to 2.7; the metal layer is a layer containing silver; the total thickness of all metal layer(s) is from 25 to 100 nm; and the resistivity of the electroconductive film is from 2.5 to 6.0 μΩcm.

Claims

1. An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12);

the refractive index of the inorganic compound is from 1.5 to 2.7;

the metal layer is a layer containing silver;

the total thickness of all metal layer(s) is from 25 to 100 nm; and

the resistivity of the electroconductive film is from 2.5 to 6.0 μ

Ω

cm.

2. The electroconductive laminate according to claim 1, wherein the inorganic compound is a metal oxide.

3. The electroconductive laminate according to claim 2, wherein the metal oxide is at least one member selected from the group consisting of an oxide of a single metal selected from zinc, titanium, niobium, tantalum, indium, tin, chromium, hafnium, zirconium and magnesium, and a composite oxide of two or more of the above metals.

4. The electroconductive laminate according to claim 1, 2 or 3, wherein in the metal layer, the silver content is at least 90 mass %.

5. The electroconductive laminate according to claim 1, 2 or 3, wherein two to eight metal layers are provided.

6. The electroconductive laminate according to claim 1, 2 or 3, wherein the thickness of each metal layer is from 5 to 25 nm.

7. The electroconductive laminate according to claim 4, wherein two to eight metal layers are provided.

8. The electroconductive laminate according to claim 4, wherein the thickness of each metal layer is from 5 to 25 nm.

9. The electroconductive laminate according to claim 8, wherein the thickness of each metal layer is from 5 to 25 nm.

10. An electromagnetic wave shielding film for a plasma display, which is an electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has a multilayer structure having a high refractive index layer containing an inorganic compound and a metal layer alternately laminated from the substrate side in a total layer number of (2n+1) (wherein n is an integer of from 1 to 12);

the refractive index of the inorganic compound is from 1.5 to 2.7;

the metal layer is a layer containing silver;

the total thickness of all metal layer(s) is from 25 to 100 nm; and

the resistivity of the electroconductive film is from 2.5 to 6.0 μ

Ω

cm.

11. The electromagnetic wave shielding film for a plasma display according to claim 10, wherein the inorganic compound is a metal oxide.

12. The electromagnetic wave shielding film for a plasma display according to claim 11, wherein the metal oxide is at least one member selected from the group consisting of an oxide of a single metal selected from zinc, titanium, niobium, tantalum, indium, tin, chromium, hafnium, zirconium and magnesium, and a composite oxide of two or more of the above metals.

13. The electromagnetic wave shielding film for a plasma display according to claim 10, 11 or 12, wherein in the metal layer, the silver content is at least 90 mass %.

14. The electromagnetic wave shielding film for a plasma display according to any one of claims 10 to 13, wherein two to eight metal layers are provided.

15. A protective plate for a plasma display, comprising a support, the electromagnetic wave shielding film for a plasma display as defined in any one of claims 10 to 12 formed on the support, and an electrode electrically in contact with the electroconductive film of the electromagnetic wave shielding film for a plasma display.

16. The protective plate for a plasma display according to claim 15, wherein in the metal layer, the silver content is at least 90 mass %.

17. The protective plate for a plasma display according to claim 15, wherein two to eight metal layers are provided.

18. The protective plate for a plasma display according to claim 16, wherein two to eight metal layers are provided.