PROCESSING CHAMBER WITH HEATED CHAMBER LINER

• US 20080178797A1
• Filed: 01/30/2007
• Published: 07/31/2008
• Est. Priority Date: 01/30/2007
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Kim, Bok Hoen, FODOR, MARK A., Velastegui, Sophia M., DuBois, Dale R.
• Granted Patent: US 8,444,926 B2
• Time in Patent Office: Days
• US Class Current: 118/75
• CPC Class Codes: C23C 16/46 characterised by the method used for heating the substrate C23C16/48, C23C16/50 take precedence

Abstract

A heater liner assembly suitable for covering the interior of a plasma processing chamber is provided. In some embodiments, a liner assembly for a processing chamber can include a heating element embedded in a body. A flange extending outward from an outer diameter of the body includes an upper surface having a sealing surface and at least one pad that extends from the upper surface of the flange to an elevation beyond the sealing surface. The pad contributes to control of the temperature of the liner assembly by maintaining the liner assembly spaced apart from the processing chamber.

Claims

1. A liner assembly for a processing chamber, comprising:

a body;

a heater embedded in the body;

a flange extending outward from an outer diameter of the body, a portion of an upper surface of the flange having a sealing surface; and

at least one contact pad extending from the upper surface of the flange to an elevation above the sealing surface.

2. The liner assembly of claim 1 further comprising:

at least one thermal choke defined in the flange.

3. The liner assembly of claim 2, wherein the choke further comprises:

at least one groove formed in the flange inward of the contact pad.

4. The liner assembly of claim 1 further comprising:

a plurality of thermal chokes formed in the flange.

5. The liner assembly of claim 1, wherein the flange further comprising:

a recess formed in the upper surface between the sealing surface and the contact pad.

6. The liner assembly of claim 1, wherein the heater further comprises:

at least one resistive element.

7. The liner assembly of claim 1, wherein the heater is configured to provide greater heating capacity along a first perimeter section of the body relative to a second perimeter section.

8. The liner assembly of claim 1, wherein the heater further comprises:

a plurality of resistive heating elements.

9. The liner assembly of claim 8, wherein the resistive heating elements are arranged in a polar array.

10. The liner assembly of claim 8, wherein the resistive heating elements are disposed more densely in one region relative to another region.

11. The liner assembly of claim 1 further comprising:

at least one pad extending from a lower surface of the body and configured to maintain the body in a spaced apart relation relative to a liner support surface of a chamber body.

12. The liner assembly of claim 1, wherein an inner diameter surface of the body bounds a portion of a pumping cavity.

13. The liner assembly of claim 12 further comprising:

a pumping aperture disposed through the body and fluidly coupling to the pumping cavity through the inner diameter surface.

14. The liner assembly of claim 1 further comprising:

a pumping liner forming an inner boundary of the pumping cavity.

15. The liner assembly of claim 14, wherein the pumping liner further comprises:

a plurality of pumping ports formed therethrough and fluidly coupled to the pumping cavity.

16. The liner assembly of claim 1, wherein the body further comprises:

a substrate access port formed therethrough.

17. The liner assembly of claim 1 further comprising:

a tubular sleeve coupled to the body and aligned with the substrate access port.

18. A liner assembly for a processing chamber, comprising:

a ceramic body having an inner diameter surface bounding a portion of a pumping cavity;

a pumping aperture disposed through the body and fluidly coupling to the pumping cavity through the inner diameter surface

a heater embedded in the body;

a flange extending outward from an outer diameter of the body, a portion of an upper surface of the flange having a sealing surface;

at least one contact pad extending from the upper surface of the flange to an elevation above the sealing surface;

at least one thermal choke defined in the flange; and

a recess formed in the upper surface between the sealing surface and the pad.

19. A liner assembly for a processing chamber, comprising:

an annular ceramic heater liner having at least one heater embedded therein, the heater liner having a contact pad configured to minimize contact area with the processing chamber;

an annular ceramic pumping liner disposed adjacent to and radially inward of the heater liner, the pumping liner having a plurality of pumping ports formed therethrough that are configured to allow entry of gases into a pumping cavity defined between the pumping liner and heater liner; and

a tubular sleeve coupled to the heater liner, the sleeve having a substrate passage formed therethrough.

20. The liner assembly )f claim 19, wherein the heater liner further comprises:

at least one thermal choke.

21. The liner assembly of claim 19, wherein the heater liner further comprises:

at least one resistive heater capable of asymmetrically heating the heater liner.