RF Power Amplifier Stability Network
First Claim
1. A radio frequency generator for applying RF power to a load, comprising:
- a DC power supply;
at least one switch that generates the RF power at a center frequency; and
a low-pass terminated network connected between the DC power supply and the switch and having a first cutoff frequency that is less than the center frequency, the low-pass terminated network providing offline impedance control at a frequency less than the center frequency; and
a high-pass filter interposed between an output of the switch and the load, the high-pass filter having a second cutoff frequency less than the center frequency, the high-pass filter providing inline isolation of the switch from the load at a frequencies less than the center frequency.
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Accused Products
Abstract
A radio frequency (RF) generator for applying RF power to a plasma chamber includes a DC power supply (B+). A radio frequency switch generates the RF power at a center frequency f0. A low-pass dissipative terminated network connects between the DC power supply (B+) and the switch and includes operates at a first cutoff frequency. The switch outputs a signal to an output network which improves the fidelity of the system. The output network generates an output signal fed to a high-pass subharmonic load isolation filter that passes RF power above a predetermined frequency. A low-pass harmonic load isolation filter may be inserted between the output network and the high-pass subharmonic load isolation filter, and a high-pass terminated network may connect to the output of the output network. The high-pass terminated network dissipates RF power above a predetermined frequency. An offline short or shunt network may connect between the output of the switch and the input of the output network for shorting the output of the switch at predetermined frequencies.
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Citations
71 Claims
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1. A radio frequency generator for applying RF power to a load, comprising:
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a DC power supply; at least one switch that generates the RF power at a center frequency; and a low-pass terminated network connected between the DC power supply and the switch and having a first cutoff frequency that is less than the center frequency, the low-pass terminated network providing offline impedance control at a frequency less than the center frequency; and a high-pass filter interposed between an output of the switch and the load, the high-pass filter having a second cutoff frequency less than the center frequency, the high-pass filter providing inline isolation of the switch from the load at a frequencies less than the center frequency. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A radio frequency generator for applying RF power to a plasma chamber, comprising:
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a DC power supply; a radio frequency transistor that generates the RF power at a center frequency; and a stability network including; a low-pass terminated network connected inline with the DC power supply and the transistor, the low-pass terminated network and having a first cutoff frequency less than the center frequency; and a high-pass filter inline with the RF power, the high-pass filter having a second cutoff frequency less than the center frequency, low-pass terminated network and high-pass filter cooperating with the low-pass terminated network to control an impedance at the transistor over a predetermined frequency of operation below the center frequency. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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27. A radio frequency generator for applying RF power to a plasma chamber, comprising:
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radio frequency transistors that generate RF power at a center frequency; low-pass dissipative terminated networks connected between respective ones of the transistors and associated DC power sources; and a combiner that generates an RF power signal based on the RF power from the radio frequency transistors, wherein the RF power signal is applied to the load; and wherein the low-pass dissipative terminated networks have a first cutoff frequency that is less than the center frequency. - View Dependent Claims (28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50)
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51. A radio frequency generator for applying RF power to a plasma chamber, comprising:
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radio frequency transistors that generate RF power at a center frequency; high-pass filters in series with respective RF power from the transistors and including a first cutoff frequency that is less than the center frequency; and a combiner that generates an RF power signal based on the RF power from the radio frequency transistors, wherein the RF power signal is applied to the plasma generator. - View Dependent Claims (52, 53, 54, 55, 56, 57, 58, 59, 60)
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61. A radio frequency generator for applying RF power to a plasma chamber, comprising:
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radio frequency transistors that generate RF power at a center frequency; a combiner that generates an RF power signal based on the RF power from the radio frequency transistors; and a stability network including a high-pass filter inline with the RF power and located in close proximity to an output of the radio frequency transistor, the high-pass filter having a first cutoff frequency less than the center frequency. - View Dependent Claims (62, 63, 64, 65, 66, 67, 68, 69, 70, 71)
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Specification