Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
First Claim
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1. An alignment method using a marker structure, the method comprising:
- providing at least one light beam directed on a marker structure comprising a plurality of first structural elements, and a plurality of second structural elements, wherein at least one first structural element of the plurality of first structural elements comprises a plurality of primary lines and a plurality of first interposed lines;
detecting light received from the marker structure at a sensor; and
determining alignment information from the detected light, the alignment information comprising information relating to a position of the marker structure, wherein the at least one light beam has a linear polarization extending substantially perpendicular to a direction of a periodic structure formed by the plurality of first interposed lines, or the sensor has a polarization filter which allows transmission of light having that linear polarization.
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Abstract
A marker structure on a substrate for optical alignment of the substrate includes a plurality of first structural elements and a plurality of second structural elements. In use, the marker structure allows the optical alignment based upon providing at least one light beam directed on the marker structure, detecting light received from the marker structure at a sensor, and determining alignment information from the detected light, the alignment information comprising information relating a position of the substrate to the sensor.
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Citations
25 Claims
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1. An alignment method using a marker structure, the method comprising:
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providing at least one light beam directed on a marker structure comprising a plurality of first structural elements, and a plurality of second structural elements, wherein at least one first structural element of the plurality of first structural elements comprises a plurality of primary lines and a plurality of first interposed lines; detecting light received from the marker structure at a sensor; and determining alignment information from the detected light, the alignment information comprising information relating to a position of the marker structure, wherein the at least one light beam has a linear polarization extending substantially perpendicular to a direction of a periodic structure formed by the plurality of first interposed lines, or the sensor has a polarization filter which allows transmission of light having that linear polarization. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An alignment method using a marker structure, the method comprising:
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providing at least one light beam directed on a marker structure comprising a plurality of first structural elements, and a plurality of second structural elements, wherein at least one first structural element of the plurality of first structural elements comprises a plurality of primary lines and a plurality of first interposed lines; detecting light received from the marker structure at a sensor; and determining alignment information from the detected light, the alignment information comprising information relating to a position of the marker structure, wherein the at least one light beam has a linear polarization extending substantially parallel to a direction of a periodic structure formed by the plurality of first interposed lines, or the sensor has a polarization filter which allows transmission of light having that linear polarization. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A lithographic projection apparatus, comprising:
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a support configured to support a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and a substrate alignment system configured to detect a position of the substrate relative to a position of the patterning device, wherein the substrate alignment system is configured to provide at least one light beam directed on a marker structure comprising a plurality of first structural elements, and a plurality of second structural elements, wherein at least one first structural element of the plurality of first structural elements comprises a plurality of primary lines and a plurality of first interposed lines, wherein the substrate alignment system is configured to detect light received from the marker structure and to determine the position from the detected light, and wherein the at least one light beam has a linear polarization extending substantially perpendicular to a direction of a periodic structure formed by the plurality of first interposed lines, or the substrate alignment system has a polarization filter which allows transmission of light having that linear polarization.
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Specification