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Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process

  • US 20080183446A1
  • Filed: 11/08/2007
  • Published: 07/31/2008
  • Est. Priority Date: 11/08/2006
  • Status: Active Grant
First Claim
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1. A method of generating a model for simulating the imaging performance of an optical imaging system;

  • said method comprising the steps of;

    defining said optical imaging system and a process to be utilized by said optical imaging system;

    defining a first model representing the imaging performance of said optical imaging system and said process and calibrating said model, said first model generating values corresponding to a developed image dimension and a latent image slope; and

    defining a second model for estimating a line width roughness of a feature to be imaged, said second model utilizing said latent image slope values to estimate said line width roughness.

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