Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process
First Claim
1. A method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, comprising the steps of:
- (a) defining a region of influence which indicates the minimum necessary space between features to be imaged;
(b) selecting a vertex associated with a feature of said target pattern,(c) determining if an edge of another feature is within said region of influence with respect to said vertex; and
(d) splitting said another feature into two polygons if said edge of another feature is within said region of influence.
2 Assignments
0 Petitions
Accused Products
Abstract
A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of the target pattern; (c) determining if an edge of another feature is within the region of influence with respect to the vertex; and (d) splitting the another feature into two polygons if the edge of another feature is within the region of influence.
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Citations
18 Claims
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1. A method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, comprising the steps of:
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(a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining if an edge of another feature is within said region of influence with respect to said vertex; and (d) splitting said another feature into two polygons if said edge of another feature is within said region of influence. - View Dependent Claims (2, 3, 4, 5, 17)
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6. A computer readable medium bearing a computer program for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, the computer program, when executed, causing a computer to perform the steps of:
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(a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining if an edge of another feature is within said region of influence with respect to said vertex; and (d) splitting said another feature into two polygons if said edge of another feature is within said region of influence. - View Dependent Claims (7, 8, 9, 10)
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11. A device manufacturing method comprising the steps of:
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(a) providing a substrate that is at least partially covered by a layer of radiation-sensitive material; (b) providing a projection beam of radiation using an imaging system; (c) using a target pattern on a mask to endow the projection beam with a pattern in its cross-section; (d) projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material, wherein, in step (c), said mask is formed by a method comprising the steps of; (e) defining a region of influence which indicates a minimum necessary space between features of said target pattern to be imaged; (f) selecting a vertex associated with a feature of said target pattern, (g) determining if an edge of another feature is within said region of influence with respect to said vertex; and (h) splitting said another feature into two polygons if said edge of another feature is within said region of influence.
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12. A method for generating masks to be utilized in a photolithography process, said method comprising the steps of:
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(a) defining a region of influence which indicates a minimum necessary space between features of a target pattern to be imaged; (b) selecting a vertex associated with a feature of said target pattern, (c) determining if an edge of another feature is within said region of influence with respect to said vertex; and (d) splitting said feature into two polygons if said edge of another feature is within said region of influence. - View Dependent Claims (13, 14, 15, 16, 18)
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Specification