INDUCTOR DEVICES

• US 20080186123A1
• Filed: 09/07/2007
• Published: 08/07/2008
• Est. Priority Date: 02/07/2007
• Status: Abandoned Application

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Chin, Kuo-Chiang, Tsai, Cheng-Hua, Chen, Chang-Sheng, Shyu, Chin-Sun, WEI, Chang-Lin
• Application Number:
  US11/852,094
• Publication Number:
  US 20080186123A1
• Time in Patent Office: Days
• US Class Current: 336/200
• CPC Class Codes: H01F 17/0013 with stacked layers
• CPC Class Codes: H01F 17/02 without magnetic core
• CPC Class Codes: H01F 2017/002 Details of via holes for interconnecting the layers
• CPC Class Codes: H01F 2017/0046 with a conductive path having a bridge
• CPC Class Codes: H01F 2017/0073 with a special conductive pattern, e.g. flat spiral
• CPC Class Codes: H01F 30/08 without magnetic core

Abstract

An inductor device comprising a first conductive pattern on a first layer of a substrate, a second conductive pattern on a second layer of the substrate, and a first region between the first layer and the second layer through which at least one hole is coupled between the first dielectric layer and the second dielectric layer, wherein a magnetic field induced by at least one of the first conductive pattern or the second conductive pattern at the first region is more intensive than that induced by at least one of the first conductive pattern or the second conductive pattern at a second region between the first conductive layer and the second conductive layer.

Claims

1. An inductor device comprising:

a substrate having at least one substrate layer;

a conductive coil formed on one of the at least one substrate layer, the conductive coil having two terminals and including a plurality of connected spirals between the two terminals; and

a first area on a surface of the one substrate layer at which a first hole is provided through the surface, the first area being surrounded by at least one of the connected spirals of the conductive coil.

2. The inductor device of claim 1, wherein the hole has a cross-sectional shape having at least one of a substantially slot-like, circular, triangular, rectangular, polygonal and elliptical shape.

3. The inductor device of claim 1, wherein a dielectric loss tangent at the first area is smaller than that at other areas on the surface of the layer.

4. The inductor device of claim 1, wherein the hole is filled with a material having a relative permeability greater than approximately 1.1.

5. The inductor device of claim 1, wherein the hole is plated with a material having a relative permeability greater than approximately 1.1.

6. The inductor device of claim 1, wherein the hole is coated with a material having a relative permeability greater than approximately 1.1.

7. The inductor device of claim 1 further comprising a second area on the surface of the layer at which a second hole is provided, wherein the second area is spaced apart from the conductive coil.

8. The inductor device of claim 1, wherein the first hole in form includes one of a through hole, a via hole and a recessed hole.

9. The inductor device of claim 1, wherein the connected spirals include a shape of at least one of a substantially rectangular, square, circular and elliptical shape.

10. An inductor device comprising:

a substrate having at least one substrate layer;

a conductive path extending over the substrate layer and winding around a first area on a surface of the substrate layer, the conductive path having two terminals and comprising a plurality of conductive windings; and

A second area on the surface of the substrate layer at which at least one hole is provided through the surface, the second area being substantially surrounded by at least one of the plurality of conductive windings.

11. The inductor device of claim 10, wherein a dielectric loss tangent at the second area is smaller than that at other areas on the surface of the layer.

12. The inductor device of claim 10, wherein the at least one hole has a cross-sectional shape having at least one of a substantially slot-like, circular, triangular, rectangular, polygonal and elliptical shape.

13. The inductor device of claim 10, wherein one of the at least one hole is provided with a material having a relative permeability greater than approximately 1.1.

14. The inductor device of claim 10 further comprising a third area on the surface of the layer at which a second hole is provided, wherein the third area is spaced apart from the plurality of conductive windings.

15. The inductor device of claim 10, wherein the at least one hole in form includes one of a through hole, a via hole and a recessed hole.

16. An inductor device comprising:

a first conductive pattern on a first layer of a substrate;

a second conductive pattern on a second layer of the substrate; and

a first region between the first layer and the second layer through which at least one hole is coupled between the first layer and the second layer, wherein a magnetic field induced by at least one of the first conductive pattern or the second conductive pattern at the first region is more intensive than a magnetic field induced by at least one of the first conductive pattern or the second conductive pattern at a second region between the first layer and the second layer.

17. The inductor device of claim 16, wherein a dielectric loss tangent in the first region is smaller than that in the second region.

18. The inductor device of claim 16, wherein the at least one hole has a cross-sectional shape having at least one of a substantially slot-like, circular, triangular, rectangular, polygonal and elliptical shape.

19. The inductor device of claim 16, wherein one of the at least one hole is provided with a material having a relative permeability greater than approximately 1.1.

20. The inductor device of claim 16, wherein at least one hole is provided into the different region.

21. The inductor device of claim 16, wherein the at least one hole in form includes one of a through hole, a via hole and a recessed hole.

22. An inductor device comprising:

a first conductive coil;

a second conductive coil; and

a first region through which at least one hole is provided, wherein a magnetic field induced by at least one of the first conductive coil or the second conductive coil at the first region is more intensive than that induced by at least one of the first conductive coil or the second conductive coil at a second region.

23. The inductor device of claim 22, wherein the first conductive coil and the second conductive coil are formed on a layer of a substrate.

24. The inductor device of claim 23, wherein the first region is located on a surface of the layer.

25. The inductor device of claim 23, wherein at least a portion of the first conductive coil and at least a portion of the second conductive coil are interleaved with one another.

26. The inductor device of claim 23, wherein at least a portion of the first conductive coil is substantially surrounded by at least a portion of the second conductive coil.

27. The inductor device of claim 22, wherein the at least one hole has a cross-sectional shape having at least one of a substantially slot-like, circular, triangular, rectangular, polygonal and elliptical shape.

28. The inductor device of claim 22, wherein one of the at least one hole is provided with a material having a relative permeability greater than approximately 1.1.

29. The inductor device of claim 28, wherein the material includes at least one of iron, cobalt or nickel.

30. The inductor device of claim 22, wherein the first conductive coil is formed on a first layer of a substrate, and the second conductive coil is formed on a second layer of the substrate.

31. The inductor device of claim 30, wherein the first region is located between the first layer and the second layer.

32. The inductor device of claim 30, wherein the first layer and the second layer communicate with one another through the at least one hole.

33. The inductor device of claim 22, wherein a dielectric loss tangent at the first region is smaller than that at a second region.