Coupling apparatus, exposure apparatus, and device fabricating method
First Claim
Patent Images
1. A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
a substrate table configured to hold a substrate;
a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part, wherein each part comprises an optical element of the projection system and the first and second parts are not attached to and movable with the substrate; and
a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid.
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Abstract
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.
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Citations
35 Claims
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1. A lithographic projection apparatus comprising:
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an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part, wherein each part comprises an optical element of the projection system and the first and second parts are not attached to and movable with the substrate; and a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A device manufacturing method, comprising:
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providing a liquid to a space between a substrate on a substrate table of a lithographic apparatus and a first part of a projection system of the lithographic apparatus, a second part of the projection system being substantially isolated from the first part such that vibrations in the second part are substantially prevented from being transferred to the first part and the first and second parts are not attached to and movable with the substrate; and projecting a patterned beam of radiation, using the first and second parts of the projection system, through the liquid onto a target portion of a substrate. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A lithographic projection apparatus comprising:
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an illumination system arranged to condition a radiation beam; a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table that holds a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising two separate physical parts that are decoupled, wherein each part comprises an optical element of the projection system; and a liquid supply system that at least partly fills a space between the projection system and the substrate, with a liquid, wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and substrate is filled with the liquid. - View Dependent Claims (16, 17, 18, 19, 20, 21)
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22. An apparatus capable of projecting light comprising:
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a frame; a lens system disposed within said frame; a horizontal support surface generally associated with said frame capable of holding a semiconductor wafer; a final lens element in said lens system, positioned near a first end of said frame, said final lens element having a final lens element surface, said final lens element surface capable of being positioned near said semiconductor wafer; and a light source positioned near a second end of said frame, said light source capable of passing light through said lens system; wherein said final lens element is capable of movement relative to said frame. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification