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Method and Apparatus for Measurement of Chromatic Aberrations of Optical Systems

  • US 20080186474A1
  • Filed: 01/23/2006
  • Published: 08/07/2008
  • Est. Priority Date: 01/23/2005
  • Status: Abandoned Application
First Claim
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1. An imaging method for use in determining artifacts of an optical system, the method comprising:

  • using said optical system for acquiring at least two images of a patterned target, wherein each said image having at least one reference area and at least one measurement area, all said reference image areas being generated identically for all said images and said measurement areas being generated at different wavelengths for each said image, thereby enabling determination of the artifact of the optical system by comparing positions of the pattern image in the measurement areas of said at least two images, wherein said positions of the pattern image in the measurement areas being determined relative to positions of the pattern image in the reference areas of the corresponding images.

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