Method and Apparatus for Measurement of Chromatic Aberrations of Optical Systems
First Claim
Patent Images
1. An imaging method for use in determining artifacts of an optical system, the method comprising:
- using said optical system for acquiring at least two images of a patterned target, wherein each said image having at least one reference area and at least one measurement area, all said reference image areas being generated identically for all said images and said measurement areas being generated at different wavelengths for each said image, thereby enabling determination of the artifact of the optical system by comparing positions of the pattern image in the measurement areas of said at least two images, wherein said positions of the pattern image in the measurement areas being determined relative to positions of the pattern image in the reference areas of the corresponding images.
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Abstract
Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target (64) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The difference of the edge images generated by the optical system (60) when illuminated by the first illumination and the second illumination measured in a predefined plane represents the optical artifact.
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Citations
21 Claims
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1. An imaging method for use in determining artifacts of an optical system, the method comprising:
- using said optical system for acquiring at least two images of a patterned target, wherein each said image having at least one reference area and at least one measurement area, all said reference image areas being generated identically for all said images and said measurement areas being generated at different wavelengths for each said image, thereby enabling determination of the artifact of the optical system by comparing positions of the pattern image in the measurement areas of said at least two images, wherein said positions of the pattern image in the measurement areas being determined relative to positions of the pattern image in the reference areas of the corresponding images.
- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A system comprising:
i) a patterned target;
ii) an optical system to be tested, and iii) an image acquisition assembly capable to acquire at least two images of said patterned target, wherein each said image having at least one reference area and at least one measurement area, all said reference image areas being generated identically for all said images and said measurement areas being generated at different wavelengths for each said image, thereby enabling determination of the artifact of the optical system by comparing positions of the pattern image in the measurement areas of said at least two images, wherein said positions of the pattern image in the measurement areas being determined relative to positions of the pattern image in the reference areas of the corresponding images.- View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21-23. -23. (canceled)
Specification