METHOD OF FABRICATING REFLECTIVE SPATIAL LIGHT MODULATOR HAVING HIGH CONTRAST RATIO

• US 20080192325A1
• Filed: 04/25/2008
• Published: 08/14/2008
• Est. Priority Date: 09/29/2005
• Status: Active Grant

• Current Assignee: Miradia Inc. (Walsin Lihwa Corporation)
• Original Assignee: Miradia Inc. (Walsin Lihwa Corporation)
• Inventors: Huang, Kegang, Yang, Xiao, Chen, Dongmin
• Granted Patent: US 7,923,789 B2
• Time in Patent Office: Days
• US Class Current: 359/223.1
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

The contrast offered by a spatial light modulator device may be enhanced by positioning nonreflective elements such as supporting posts and moveable hinges, behind the reflecting surface of the pixel. In accordance with one embodiment, the reflecting surface is suspended over and underlying hinge-containing layer by integral ribs of the reflecting material defined by gaps in a sacrificial layer. In accordance with an alternative embodiment, the reflecting surface is separated from the underlying hinge by a gap formed in an intervening layer, such as oxide. In either embodiment, walls separating adjacent pixel regions may be recessed beneath the reflecting surface to further reduce unwanted scattering of incident light and thereby enhance contrast.

Claims

1. A reflecting structure comprising:

a CMOS substrate comprising an electrode;

a first post and a second post, each of the first post and the second post being coupled to the CMOS substrate, wherein the first post and the second post overlie the CMOS substrate and define a first distance separating the first post and the second post;

a moveable stack overlying each of the first post and the second post, the moveable stack comprising;

a silicon layer defining;

a moveable hinge portion extending between the first post and the second post; and

a mirror support portion;

a plurality of supporting structures coupled to the mirror support portion; and

a reflecting surface supported by and overlying the plurality of supporting structures, wherein the reflecting surface is free from contact with the moveable hinge portion and is characterized by a distance measured between diagonal corners of the reflecting surface greater than the first distance.

2. The reflecting structure of claim 1 wherein the reflecting surface is supported over the moveable hinge by integral downward projections of the reflecting surface.

3. The reflecting structure of claim 2 wherein the integral downward projections comprise aluminum.

4. The reflecting structure of claim 2 wherein the reflecting surface and the integral downward projections are part of a single continuous piece of material.

5. The reflecting structure of claim 4 wherein the reflecting surface and the integral downward projections have a thickness of about 1000-5000 Å

.

6. The reflecting structure of claim 1 wherein the reflecting surface is supported over the moveable hinge by a dielectric layer defining a space over the hinge.

7. The reflecting structure of claim 1 wherein the reflecting surface comprises aluminum.

8. The reflecting structure of claim 1 wherein the reflecting surface overlies the posts and the moveable hinge structure.

9. The reflecting structure of claim 1 further comprising a conducting layer.

10. The reflecting structure of claim 9 wherein the conducting layer underlies the reflective surface and overlies the silicon layer.

11. The reflecting structure of claim 9 wherein the conducting layer includes titanium and aluminum.

12. The reflecting structure of claim 1 wherein the post comprises a conducting layer.

13. The reflecting structure of claim 12 wherein the conducting layer underlies the reflective surface and overlies the silicon layer.

14. The reflecting structure of claim 12 wherein the conducting layer includes titanium and aluminum.

15. A reflecting structure comprising:

a CMOS substrate comprising an electrode;

a wall having a lower surface coupled to the CMOS substrate and an upper surface disposed opposite the lower surface and separated from the lower surface by a wall height, wherein the wall overlies the CMOS substrate;

a first post characterized by a post height and a second post characterized by the post height, each of the first post and the second post being coupled to the CMOS substrate, wherein the first post and the second post overlie the CMOS substrate and the post height is greater than the wall height;

a moveable stack overlying each of the first post and the second post, the moveable stack comprising;

a silicon layer defining;

a moveable hinge portion extending between the first post and the second post; and

a mirror support portion;

a plurality of supporting structures coupled to the mirror support portion; and

a reflecting surface supported by and overlying the plurality of supporting structures, wherein the reflecting surface is free from contact with the moveable hinge portion.

16. The reflecting structure of claim 15 wherein the wall includes an oxide.

17. The reflecting structure of claim 15 wherein the wall separates adjacent reflecting structures.

18. The reflecting structure of claim 15 wherein a first distance between the moveable stack and the underlying CMOS substrate is greater than a second distance between the moveable stack and the upper surface of the wall.

19. The reflecting structure of claim 15 wherein the wall is recessed beneath the reflecting surface and moveable stack.

20. The reflecting structure of claim 15 wherein the hinge includes a first fixed portion and a second fixed portion, the first fixed portion overlying the first post and the second fixed portion overlying the second post.

21. The reflecting structure of claim 15 wherein the first post and the second post are separated by a first distance and the reflecting surface is characterized by a distance measured between diagonal corners greater than the first distance.