Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode
First Claim
1. A method of processing a workpiece in a plasma reactor chamber, comprising:
- providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions;
providing in the in-situ plate an array of feed-through openings with different opening sizes to present a non-uniform distribution of gas flow resistance for gas flow from said upper chamber region to said lower chamber region;
introducing a first process gas into the upper chamber region and generating a plasma in said upper chamber region;
introducing a second process gas in the lower chamber region through gas injection orifices of the in-situ gas distribution plate.
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Accused Products
Abstract
A method of processing a workpiece in a plasma reactor chamber is disclosed. The method includes providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions. The method further includes providing in the in-situ plate an array of feed-through openings with different opening sizes to present a non-uniform distribution of gas flow resistance for gas flow from the upper chamber region to the lower chamber region. A first process gas is introduced into the upper chamber region and a plasma is generated a plasma in the upper chamber region. A second process gas is introduced in the lower chamber region through gas injection orifices of the in-situ gas distribution plate.
101 Citations
22 Claims
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1. A method of processing a workpiece in a plasma reactor chamber, comprising:
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providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions; providing in the in-situ plate an array of feed-through openings with different opening sizes to present a non-uniform distribution of gas flow resistance for gas flow from said upper chamber region to said lower chamber region; introducing a first process gas into the upper chamber region and generating a plasma in said upper chamber region; introducing a second process gas in the lower chamber region through gas injection orifices of the in-situ gas distribution plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method of processing a workpiece in a plasma reactor chamber, comprising:
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providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions; providing in the in-situ plate an array of feed-through openings for gas flow from said upper chamber region to said lower chamber region; introducing a first process gas into the upper chamber region and generating a plasma in said upper chamber region while introducing a second process gas in the lower chamber region through gas injection orifices of the in-situ gas distribution plate; and coupling a voltage source to a conductive electrode of the in-situ gas distribution plate. - View Dependent Claims (18, 19, 20)
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21. A method comprising:
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providing an in-situ gas distribution plate between the workpiece and a ceiling of the chamber that divides the chamber into upper and lower chamber regions; providing in the in-situ plate an array of feed-through openings with different opening sizes to present a non-uniform distribution of gas flow resistance for gas flow from said upper chamber region to said lower chamber region; and controlling a gas distribution flow through said in-situ gas distribution plate. - View Dependent Claims (22)
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Specification