Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography
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Accused Products
Abstract
A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.
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Citations
82 Claims
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1-48. -48. (canceled)
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49. A refractive projection objective, comprising:
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a plurality of optical elements arranged along an optical axis of the projection objective to image a pattern arranged in an object surface of the projection objective into an image field arranged in an image surface of the projection objective with a demagnifying imaging scale, the optical elements being designed and arranged such that a single constriction of an imaging beam path is provided between the object surface and the image surface; wherein the projection objective has an image-side numerical aperture NA>
0.85 and a demagnifying imaging scale |β
|<
0.05, and that the imaging field has a minimum image field diameter of more than 1 mm. - View Dependent Claims (50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82)
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Specification