Semiconductor substrate processing apparatus with horizontally clustered vertical stacks

• US 20080202420A1
• Filed: 02/27/2007
• Published: 08/28/2008
• Est. Priority Date: 02/27/2007
• Status: Abandoned Application

• Current Assignee: James Carter Hall, Jeffrey G. Ellison, John M. Smith
• Original Assignee: James Carter Hall, Jeffrey G. Ellison, John M. Smith
• Inventors: Smith, John M., Ellison, Jeffrey G., Hall, James Carter
• Application Number:
  US11/711,488
• Publication Number:
  US 20080202420A1
• Time in Patent Office: Days
• US Class Current: 118/719
• CPC Class Codes: C23C 14/566 using a load-lock chamber
• CPC Class Codes: C23C 14/568 Transferring the substrates through a series of coating stations C23C14/562 takes precedence
• CPC Class Codes: C23C 16/54 Apparatus specially adapted for continuous coating
• CPC Class Codes: H01L 21/67167 surrounding a central transfer chamber
• CPC Class Codes: H01L 21/67178 vertical arrangement

Abstract

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. Each of the process chamber modules includes a process chamber coupled to a dedicated support system so that each process chamber module can be disconnected from the substrate transfer chamber without disrupting any of the other process chamber modules. The substrate transfer chamber includes one or more robotic arms for transferring flat-panel display substrates between the substrate load lock chamber and the plurality of process chamber modules.

Claims

1-161. -161. (canceled)

162. A flat-panel display substrate processing apparatus, comprising:

a substrate load lock chamber;

a substrate transfer chamber vacuum coupled to the substrate load lock chamber;

a plurality of process chamber modules vacuum coupled to the substrate transfer chamber, wherein each of the process chamber modules comprises a process chamber coupled to a dedicated support system so that each process chamber module can be disconnected from the substrate transfer chamber without disrupting any of the other process chamber modules; and

wherein the substrate transfer chamber comprises one or more robotic arms for transferring flat-panel display substrates between the substrate load lock chamber and the plurality of process chamber modules.

163. The apparatus of claim 162, wherein the plurality of process chamber modules are arranged in a horizontal cluster of vertically stacked process chamber modules around the substrate transfer chamber.

164. The apparatus of claim 162, wherein the plurality of process chamber modules are arranged in a horizontal cluster of three vertical stacks of process chamber modules around the substrate transfer chamber.

165. The apparatus of claim 162, wherein the plurality of process chamber modules are arranged in a horizontal cluster of vertical stacks of process chamber modules around the substrate transfer chamber, and wherein the vertical stacks of process chamber modules comprise at least three process chamber modules.

166. The apparatus of claim 162, wherein a dedicated support system of at least one process chamber module comprises a gas manifold.

167. The apparatus of claim 162, wherein a dedicated support system of at least one process chamber module comprises vacuum lines.

168. The apparatus of claim 162, wherein a dedicated support system of at least one process chamber module comprises one or more power supplies for the process chamber.

169. The apparatus of claim 162, wherein two or more of the process chamber modules are configured to operate substantially simultaneously.

170. The apparatus of claim 162, wherein the apparatus is configured to process a plurality of flat-panel display substrates substantially simultaneously.

171. The apparatus of claim 162, wherein the apparatus is configured to perform a plurality of flat-panel display substrate processes substantially simultaneously.

172. A flat-panel display substrate processing apparatus, comprising:

a substrate load lock chamber;

a substrate transfer chamber vacuum coupled to the substrate load lock chamber;

a plurality of process chamber modules vacuum coupled to the substrate transfer chamber, wherein each of the process chamber modules comprises a process chamber coupled to a dedicated support system and each process chamber module can be independently vacuum isolated from the substrate transfer chamber; and

wherein the substrate transfer chamber comprises one or more robotic arms for transferring flat-panel display substrates between the load lock chamber and the plurality of process chamber modules.

173. The apparatus of claim 172, wherein the plurality of process chamber modules are arranged in a horizontal cluster of vertically stacked process chamber modules around the substrate transfer chamber.

174. The apparatus of claim 172, wherein the plurality of process chamber modules are arranged in a horizontal cluster of three vertical stacks of process chamber modules around the substrate transfer chamber.

175. The apparatus of claim 172, wherein the plurality of process chamber modules are arranged in a horizontal cluster of vertical stacks of process chamber modules around the substrate transfer chamber, and wherein the vertical stacks of process chamber modules comprise at least three process chamber modules.

176. The apparatus of claim 172, wherein a dedicated support system of at least one process chamber module comprises a gas manifold.

177. The apparatus of claim 172, wherein a dedicated support system of at least one process chamber module comprises vacuum lines.

178. The apparatus of claim 172, wherein a dedicated support system of at least one process chamber module comprises one or more power supplies for the process chamber.

179. The apparatus of claim 172, wherein two or more of the process chamber modules are configured to operate substantially simultaneously.

180. The apparatus of claim 172, wherein the apparatus is configured to process a plurality of flat-panel display substrates substantially simultaneously.

181. The apparatus of claim 172, wherein the apparatus is configured to perform a plurality of flat-panel display substrate processes substantially simultaneously.

182-255. -255. (canceled)