Microwave hybrid and plasma rapid thermal processing of semiconductor wafers
First Claim
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1. A hybrid microwave process for rapid thermal processing of a substrate, comprising:
- disposing a substrate to be heated in a cavity;
providing a hybrid material comprised of a microwave modulator material, the hybrid material located with respect to the substrate to attenuate microwave radiation prior to reaching at least a portion of the substrate; and
introducing microwave radiation into the cavity to heat the substrate, at least a portion of the microwave radiation attenuated by the hybrid material prior to reaching the substrate, wherein the hybrid material causes heat to be distributed more uniformly to the substrate.
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Abstract
Microwave energy is used as a radiation source for rapid thermal processing of semiconductor wafers. In one aspect, a hybrid material formed from a microwave modulator material is used to provide temperature uniformity across the wafer and to avoid cracking or breaking of wafers due to the development of thermal stresses. In another aspect, microwave-generated atmospheric pressure plasma is used to heat the wafer either directly or indirectly.
16 Citations
35 Claims
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1. A hybrid microwave process for rapid thermal processing of a substrate, comprising:
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disposing a substrate to be heated in a cavity; providing a hybrid material comprised of a microwave modulator material, the hybrid material located with respect to the substrate to attenuate microwave radiation prior to reaching at least a portion of the substrate; and introducing microwave radiation into the cavity to heat the substrate, at least a portion of the microwave radiation attenuated by the hybrid material prior to reaching the substrate, wherein the hybrid material causes heat to be distributed more uniformly to the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A plasma microwave process for rapid thermal processing of a substrate, comprising:
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enclosing a substrate to be heated at least partially in a sheath comprised of a heat conductive material; disposing the substrate enclosed in the sheath in a cavity; heating the substrate by forming a plasma in the cavity by subjecting a gas in the cavity to microwave radiation, whereby the plasma heats the substrate. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification