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Structure and Method for Forming Accumulation-mode Field Effect Transistor with Improved Current Capability

  • US 20080211012A1
  • Filed: 05/02/2008
  • Published: 09/04/2008
  • Est. Priority Date: 12/30/2003
  • Status: Active Grant
First Claim
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1. An accumulation-mode field effect transistor comprising:

  • a drift region of a first conductivity type;

    channel regions of the first conductivity type over and in contact with the drift region;

    gate trenches having sidewalls abutting the channel regions, the gate trenches extending into the drift region; and

    a first plurality of silicon regions of a second conductivity type forming P-N junctions with the channel regions along vertical walls of the first plurality of silicon regions, the first plurality of silicon regions extending into the drift region so as to form P-N junctions with the drift region along bottoms of the first plurality of silicon regions.

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