CUSTOMIZED CONTACT LENSES FOR REDUCING ABERRATIONS OF THE EYE

• US 20080212024A1
• Filed: 09/18/2007
• Published: 09/04/2008
• Est. Priority Date: 09/18/2006
• Status: Abandoned Application

• Current Assignee: Shui T. Lai
• Original Assignee: Shui T. Lai
• Inventors: Lai, Shui T.
• Application Number:
  US11/857,365
• Publication Number:
  US 20080212024A1
• Time in Patent Office: Days
• US Class Current: 351/205
• CPC Class Codes: G02C 2202/22 Correction of higher order and chromatic aberrations, wave front measurement and calculation
• CPC Class Codes: G02C 7/028 Special mathematical design techniques
• CPC Class Codes: G02C 7/04 Contact lenses for the eyes disinfection or sterilisation of contact lenses A61L12/00
• CPC Class Codes: G02C 7/046 Contact lenses having an iris pattern

Abstract

Higher order aberrations of an eye are reduced. Wavefront aberrations of the eye are measured, providing wavefront information and/or a wavefront map. A mask is derived from the wavefront information and/or wavefront map based on the measured wavefront aberrations. A customized contact lens is formed including the mask. The deriving of the mask includes optimizing a figure of merit using a PSF, a MTF, and/or another image quantifier.

Claims

1. A system for reducing wavefront aberrations of an eye, comprising:

(a) a wavefront aberrometer for measuring wavefront information of an eye;

(b) a computer program embodied within one or more storage media for programming one or more processors to derive a mask covering a wavefront aberration portion of the eye based on the measured wavefront information; and

(c) a machine for forming a customized lens including the mask incorporated therein.

2. The system of claim 1, wherein the deriving of the mask comprises an optimization of a figure of merit using a PSF, a MTF, another image quantifier, or combinations thereof.

3. The system of claim 2, wherein the figure of merit comprises a light intensity volume within a circle centered at a PSF peak or at a geometric mean of a PSF intensity distribution.

4. The system of claim 2, wherein the figure or merit uses MTF and area under MTF curve, Nyquist limits, neural response as a function of spatial frequency, best sphero-cylindrical refraction or best calculated eyeglasses prescription, or combinations thereof.

5. The system of claim 1, wherein the customized lens is configured to reduce the wavefront aberrations to make at least one additional line readable in an EDTRS or Snellen eye chart or both.

6. The system of claim 1, wherein the customized lens is configured to reduce the wavefront aberrations to improve contrast sensitivity by at least 0.15 in log scale or 40% in linear scale, or both.

7. The system of claim 1, wherein the machine is configured to write the customized mask accounting for a de-centered position of the lens on the eye.

8. The system of claim 1, wherein the mask is shaped to block distorted rays from one or more distortion regions of the eye, and comprises one or more masked regions from a perimeter of the lens or a ring on the lens or a combination thereof.

9. The system of claim 1, wherein the lens comprises a contact lens, an intra-corneal lens or an intraocular lens, or combinations thereof.

10. A method of reducing aberrations of an eye, comprising:

(a) measuring wavefront aberrations of an eye,

(b) generating a wavefront map or other wavefront information, or both, based on the measuring;

(c) deriving a mask from the wavefront map or other wavefront information, or both; and

(d) forming a customized lens including incorporating therein the mask.

11. The method of claim 10, wherein the deriving of the mask comprises optimizing a figure of merit using a PSF, a MTF, another image quantifier, or combinations thereof.

12. The method of claim 11, wherein the figure of merit comprises a volume of light rays within a circle centered at a PSF peak or at a geometric mean of a PSF intensity distribution.

13. The method of claim 11, wherein the figure or merit uses MTF and an area under MTF curve, Nyquist limits, neural response as a function of spatial frequency, best sphero-cylindrical refraction or best calculated eyeglasses prescription, or combinations thereof.

14. The method of claim 10, comprising reducing the wavefront aberrations to make at least one additional line readable in an EDTRS or Snellen eye chart or both.

15. The method of claim 10, comprising reducing the wavefront aberrations to improve contrast sensitivity by at least 0.15 in log scale or 40% in linear scale, or both.

16. The method of claim 10, comprising writing the mask while accounting for a de-centered position of the lens on the eye.

17. The method of claim 10, comprising shaping the customized mask to block distorted rays from one or more regions of the eye.

18. The method of claim 17, comprising forming one or more masked regions at a perimeter of the lens or a ring on the lens or a combination thereof.

19. A contact lens to improve the quality of vision of an eye after pupil dilation, comprising:

(a) a contact lens; and

(b) a masked region substantially blocking rays from transmitting through the lens and pupil, except at a central region.

20. The contact lens of claim 19, wherein the masked region comprises at least an entire dilated pupil region.

21. The contact lens of claim 19, wherein the central region transmitting light rays comprises an area including at least one dimension between approximately 2 mm and 4 mm in extent.

22. The contact lens of claim 19, wherein the central region comprises a tinted region that partially transmits light rays.

23. The contact lens of claim 22, wherein the tinted region comprises substantially the entire central region.

24. The contact lens of claim 19, wherein the contact lens has a refractive power in a range from −

3 to +3 diopters.

25. The contact lens of claim 19, wherein the central region of the mask also includes one or more specific mask portions determined based on a measurement of wavefront aberrations of an eye, and generation based on the measurement of a wavefront map or other wavefront information, or both.