Exposure Apparatus, Exposure Method, And Method For Producing Device
First Claim
1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which includes a plurality of optical elements, at least one of the plurality of optical elements having a concave surface portion making contact with the liquid; and
a removing device which removes a foreign matter in a space inside of the concave surface portion.
1 Assignment
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Accused Products
Abstract
An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid.
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Citations
56 Claims
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1. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which includes a plurality of optical elements, at least one of the plurality of optical elements having a concave surface portion making contact with the liquid; and a removing device which removes a foreign matter in a space inside of the concave surface portion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 25)
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20. An exposure apparatus which exposes a substrate by radiating an exposure light beam onto the substrate through a liquid, the exposure apparatus comprising:
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a projection optical system which includes a plurality of optical elements and which has the first optical element included in the plurality of optical elements and disposed closest to an image plane of the projection optical system, the first optical element having a concave surface portion which makes contact with the liquid, wherein; a refractive index of the liquid with respect to the exposure light beam is higher than a refractive index of the first optical element. - View Dependent Claims (21, 22, 23, 24, 35)
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26. An exposure method which exposes a substrate by radiating an exposure light beam onto the substrate via a liquid and an optical element having a concave Surface portion which makes contact with the liquid, the exposure method including:
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removing a foreign matter from the liquid in a space inside of the concave surface portion of the optical element; and exposing the substrate by radiating the exposure light beam onto the substrate via the optical element and the liquid. - View Dependent Claims (27, 28, 29, 30, 34)
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31. An exposure method for exposing a substrate by radiating an exposure light beam onto the substrate via a liquid and an optical element having a concave Surface portion which makes contact with the liquid, the exposure method including:
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supplying the liquid to a space between the substrate and the concave surface portion of the optical element, the liquid having a refractive index higher than a refractive index of the optical element; and exposing the substrate by radiating the exposure light beam onto the substrate via the optical element and the liquid. - View Dependent Claims (32, 33, 36)
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37. A lithographic projection apparatus, comprising:
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a projection system configured to project a patterned beam of radiation into an image field that is positioned off the optical axis of the projection system and onto a target portion of a substrate, the projection system comprising a concave refractive lens adjacent the substrate through which the patterned beam is projected; and a liquid supply system configured to provide a liquid to a space between the substrate and the lens. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45, 46)
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47. A device manufacturing method, comprising:
projecting an image of a pattern through a liquid onto a target portion of a substrate using a projection system, the projection system comprising a concave refractive lens adjacent the substrate through which the image is projected and the image field of the projection system being off-axis. - View Dependent Claims (48, 49, 50, 51, 52, 53, 54, 55, 56)
Specification