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Exposure Method, Exposure Apparatus, Method for Producing Device, and Method for Evaluating Exposure Apparatus

  • US 20080212056A1
  • Filed: 03/17/2006
  • Published: 09/04/2008
  • Est. Priority Date: 03/18/2005
  • Status: Active Grant
First Claim
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1. An exposure method for exposing a substrate while moving the substrate held on a substrate stage with respect to an exposure light beam in a state that an optical path space for the exposure light beam is filled with a liquid, the method comprising:

  • a first step for measuring position information of the substrate held on the substrate stage while controlling the substrate stage to move the substrate stage in a state that the optical path space is filled with the liquid under a predetermined condition;

    a second step for obtaining movement control accuracy of the substrate stage based on a result of the measurement;

    a third step for determining, based on the obtained movement control accuracy, an exposure condition for exposing the substrate; and

    a fourth step for exposing the substrate based on the determined exposure condition.

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