Method for Producing an Optical Article Coated with an Antireflection or a Reflective Coating Having Improved Adhesion and Abrasion Resistance Properties

• US 20080213473A1
• Filed: 02/22/2008
• Published: 09/04/2008
• Est. Priority Date: 02/23/2007
• Status: Active Grant

• Current Assignee: Essilor International SA
• Original Assignee: Essilor International SA
• Inventors: Roisin, Philippe, Thomas, Michele
• Granted Patent: US 8,318,245 B2
• Time in Patent Office: Days
• US Class Current: 427/162
• CPC Class Codes: B05D 5/061 Special surface effect
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: G02B 1/12 by surface treatment, e.g. by irradiation

Abstract

The invention relates to a method for producing an optical article having antireflection or reflective properties and comprising a substrate having at least one main surface, comprising the step of depositing an sub-layer onto a substrate'"'"'s main surface, the step of treating the sub-layer by ionic bombardment and the step of depositing onto said sub-layer a multilayered stack comprising at least one high refractive index layer and at least one low refractive index layer. According to a preferred embodiment, the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during the deposition step.

Claims

1-26. -26. (canceled)

27. A method for producing an optical article having antireflection or reflective properties, comprising:

providing an optical article comprising a substrate having at least one main surface;

depositing onto a main surface of the substrate a sub-layer having an exposed surface, wherein the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during said deposition;

depositing onto said exposed surface of the sub-layer a multilayered antireflection or reflective stack comprising at least one high refractive index layer and at least one low refractive index layer,

recovering an optical article comprising a substrate having a main surface coated with an antireflection or a reflective coating comprising said sub-layer and said multilayered stack,

wherein the exposed surface of the sub-layer has been submitted to an ionic bombardment treatment prior to depositing said multilayered stack.

28. The method of claim 27, wherein the optical article has antireflection properties.

29. The method of claim 27, wherein the gas comprises argon, krypton, xenon, neon, oxygen, or nitrogen.

30. The method of claim 27, wherein the sub-layer comprises an SiO₂-based layer.

31. The method of claim 30, wherein the SiO₂-based layer has a thickness of greater than or equal to 75 nm.

32. The method of claim 31, wherein the SiO₂-based layer has a thickness of greater than or equal to 100 nm.

33. The method of claim 30, wherein the sub-layer consists of said SiO₂-based layer.

34. The method of claim 33, wherein the sub-layer consists of SiO₂.

35. The method of claim 30, wherein said SiO₂-based layer is free from Al₂O₃.

36. The method of claim 30, wherein the sub-layer comprises an SiO₂ layer with a thickness that is greater than or equal to 75 nm and that is free from Al₂O₃ and at most three layers are between the substrate and the SiO₂ layer that is free from Al₂O₃.

37. The method of claim 30, wherein the SiO₂-based layer or the SiO₂ layer of the sub-layer directly contacts the multilayered stack.

38. The method of claim 30, wherein deposition of the SiO₂-based layer or of the SiO₂ layer of the sub-layer is conducted without concomitant treatment with an energetic species.

39. The method of claim 38, wherein deposition of the SiO₂-based layer or of the SiO₂ layer of the sub-layer is conducted without ion assistance.

40. The method of claim 27, wherein a treatment step with energetic species is conducted concomitantly to depositing one or more of the various layers of the antireflection coating or reflective coating.

41. The method of claim 27, wherein the deposition of the low refractive index layers of the multilayered stack is conducted in a vacuum chamber with no gas supply to the vacuum chamber during said coating deposition.

42. The method of claim 27, wherein all the low refractive index layers of the multilayered stack comprise a mixture of SiO₂ and Al₂O₃,

43. The method of claim 42, wherein the layers comprising a mixture of SiO₂ and Al₂O₃ contain from 1 to 10% Al₂O₃ as related to the total weight of SiO₂+Al₂O₃ in these layers.

44. The method of claim 27, wherein all the antireflection or reflective coating layers are deposited by evaporation under vacuum.

45. The method of claim 27, wherein the high refractive index layers of the multilayered stack comprise at least one of TiO₂, PrTiO₃, or ZrO₂.

46. The method of claim 27, wherein the multilayered stack comprises at least one electrically conductive layer.

47. The method of claim 46, wherein the electrically conductive layer comprises at least one indium oxide, tin oxide, zinc oxide, or indium-tin oxide.

48. The method of claim 27, wherein the substrate is an organic or a mineral glass.

49. The method of claim 27, wherein the optical article is an ophthalmic lens.

50. The method of claim 27, wherein the multilayered stack directly contacts the sub-layer.