×

Method of coating semiconductor processing apparatus with protective yttrium-containing coatings

  • US 20080213496A1
  • Filed: 08/02/2007
  • Published: 09/04/2008
  • Est. Priority Date: 02/14/2002
  • Status: Abandoned Application
First Claim
Patent Images

1. A method of spray-coating a surface of an article to provide erosion resistance to a halogen-containing plasma, wherein said coating is sprayed using a technique selected from the group consisting of flame spraying, thermal spraying and plasma spraying, and wherein said coating comprises at least one yttrium-containing solid solution.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×