Pellicle frame apparatus, mask, exposing method, exposure apparatus, and device fabricating method

• US 20080213679A1
• Filed: 02/29/2008
• Published: 09/04/2008
• Est. Priority Date: 03/01/2007
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Yoshimoto, Hiromitsu, Miyakawa, Tomoki
• Granted Patent: US 8,323,855 B2
• Time in Patent Office: Days
• US Class Current: 430/5
• CPC Class Codes: G03F 1/64 characterised by the frames, e.g. structure or material, including bonding means therefor

Abstract

A pellicle is provided to one end surface of end surfaces of a frame. Another end surface of the end surfaces of the frame has an area that opposes a substrate. A configuration is adopted that prevents the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.

Claims

1. A pellicle frame apparatus wherein a pellicle is provided to one end surface of end surfaces of a frame, and another end surface of the end surfaces of the frame has an opposing area that opposes a substrate, the pellicle frame apparatus comprising:

a configuration that is capable preventing the deformation of the one end surface of the frame and the shape of the opposing area on the other end surface from affecting one another.

2. A pellicle frame apparatus according to claim 1, wherein

the opposing area comprises:

a first area that is provided with a prescribed value of flexural rigidity with respect to the substrate; and

a second area that is provided with a flexural rigidity with respect to the substrate, the value of which is smaller than that of the first area.

3. A pellicle frame apparatus according to claim 2, wherein

the first area is provided so as to be in contact with the substrate;

and

the second area is provided with a gap between the second area and the substrate.

4. A pellicle frame apparatus according to claim 3, wherein

a filter member is provided that is permeable and that captures foreign matters, which are about to pass towards an interior of the frame via the gap.

5. A pellicle frame apparatus according to claim 4, wherein

the filter member is a porous member that is disposed in the gap.

6. A pellicle frame apparatus according to claim 4, wherein

the filter member is a sheet shaped cover member that covers the gap.

7. A pellicle frame apparatus according to claim 6, wherein

the filter member is provided in a recess, which is provided on the frame along the gap.

8. A pellicle frame apparatus according to claim 2, wherein

the first area and the second area are provided so as to be in contact with the substrate;

and

a slit is formed in the frame at the second area and between the end surface on the one side and the contact part of the substrate.

9. A pellicle frame apparatus according to claim 8, wherein

a second filter member is provided that is permeable and that captures foreign matters, which are about to pass towards an interior of the frame via the slit.

10. A pellicle frame apparatus according to claim 9, wherein

the second filter member is a porous member that is disposed in the slit.

11. A pellicle frame apparatus according to claim 9, wherein

the second filter member is a sheet shaped cover member that covers the slit.

12. A pellicle frame apparatus according to claim 11, wherein

the second filter member is provided in a second recess, which is provided on the frame along the slit.

13. A pellicle frame apparatus according to claim 1, wherein

the frame is formed substantially as a rectangle;

and

the frame has a plurality of sides on each of which the first area is disposed.

14. A mask wherein a pattern is formed on a substrate, comprising:

a pellicle frame apparatus according to claim 1 provided to the substrate.

15. An exposing method, comprising:

holding a mask according to claim 14 to a mask stage; and

exposing a photosensitive substrate with the pattern of the mask.

16. An exposing method according to claim 15, wherein

the exposure of the photosensitive substrate comprising synchronously moving the mask and the photosensitive substrate, and

the first area has a plurality areas that are disposed so that the areas have line symmetry with respect to an axis that is parallel to the synchronous movement direction.

17. A device fabricating method that has an exposure process, wherein

an exposing method according to claim 15 is used when performing the exposure process.

18. An exposure apparatus that exposes a substrate with a pattern that is formed on a mask, comprising:

a holding apparatus that holds a mask according to claim 14, the holding apparatus having a holding member that is capable of being transformed so as to conform with the shape of a held surface of the mask.

19. A pellicle frame apparatus comprising:

a pellicle; and

a frame comprising a first side on which the pellicle is provided and a second side having a contact surface that can be in contact with a substrate, a flatness of the contact surface being capable of being compensated in conformity to the substrate.

20. A pellicle frame apparatus according to claim 19, wherein

the contact surface is partially or entirely provided on an end face at the second side of the frame.

21. A pellicle frame apparatus comprising:

a pellicle; and

a frame, at a first side of which the pellicle is provided on an end face, at a second side of which three contact areas are configured such that all of the contact areas can be in contact with a substrate.

22. A pellicle frame apparatus according to claim 21, wherein

the frame comprises three protruding portions that are protruded from an end face at the second side,

a surface, which can be in contact with the substrate, is provided on each of the three protruding portions so as to configure the three contact areas.

23. A pellicle frame apparatus comprising:

a pellicle; and

a frame, on an end face at a first side of which the pellicle is provided, a bonded surface being formed on an end face at a second side of the frame, the bonded surface bonding the frame and a substrate, wherein

the frame comprises a first portion that has the end face at the first side and a second portion that has the end face at the second side, and wherein

the first portion is supported relative to the second portion at three points.

24. A mask apparatus comprising:

the pellicle frame apparatus according to claim 23; and

a mask substrate as the substrate, on which a predetermined pattern is formed, wherein

the pellicle covers a formation area of the pattern on the mask substrate with a predetermined gap therebetween.