Imaging System With Mirror Group

• US 20080213703A1
• Filed: 03/22/2005
• Published: 09/04/2008
• Est. Priority Date: 04/08/2004
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Dodoc, Aurelian, Epple, Alexander, Shafer, David
• Granted Patent: US 7,712,905 B2
• Time in Patent Office: Days
• US Class Current: 430/319
• CPC Class Codes: G02B 17/0804 using two curved mirrors G02B17/0864, G02B17/0896 takes precedence
• CPC Class Codes: G02B 17/0808 on-axis systems with at least one of the mirrors having a central aperture
• CPC Class Codes: G02B 17/0812 off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
• CPC Class Codes: G02B 17/0816 off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
• CPC Class Codes: G02B 17/0836 using more than three curved mirrors G02B17/0864, G02B17/0896 take precedence
• CPC Class Codes: G02B 17/0844 off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
• CPC Class Codes: G02B 17/0848 off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
• CPC Class Codes: G02B 17/086 wherein the system is made of a single block of optical material, e.g. solid catadioptric systems
• CPC Class Codes: G02B 17/0892 specially adapted for the UV
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

An imaging system for imaging an off-axis object field arranged in an object surface of the imaging system onto an off-axis image field arranged in an image surface of the imaging system while creating at least one intermediate image has: an optical axis; an in-line mirror group having an object side mirror group entry, an image side mirror group exit and a mirror group plane aligned transversly to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit, the mirror group including: a first mirror having a first mirror surface for receiving radiation coming from the object surface in a first reflecting area asymmetric to the optical axis; at least one second mirror having a second mirror surface facing the first mirror surface for receiving radiation coming from the first mirror in a second reflecting area asymmetric to the optical axis; at least one of the first and second mirrors being a concave mirror having a concave mirror surface defining a mirror axis on the optical axis; wherein the mirrors of the mirror group are arranged such that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. A strong overcorrection of image field curvature can be effected in an axially compact design.

Claims

1-77. -77. (canceled)

78. An imaging system comprising:

a plurality of optical elements configured to image an off-axis object field arranged outside an optical axis of the imaging system in an object surface of the imaging system onto an off-axis image field arranged outside the optical axis in an image surface of the imaging system and creating at least one intermediate image;

the optical elements comprising at least one mirror group having an object side mirror group entry and an image side mirror group exit, the mirror group including;

a first mirror having a first mirror surface configured to receive radiation from the mirror group entry in a first reflecting area;

at least one second mirror having a second mirror surface facing the first mirror surface and configured to receive radiation from the first mirror in a second reflecting area;

at least one of the first and second mirrors being a concave mirror having a concave mirror surface having a surface of curvature defining a mirror axis on the optical axis;

wherein the mirrors of the mirror group are arranged such that radiation from the mirror group entry is reflected at least twice on given ones of the concave mirror surfaces of the mirror group prior to exiting the mirror group at the mirror group exit, and

wherein the mirror group has at least one multiply reflecting mirror arranged such that a mirror surface of the multiply reflecting mirror is used twice at reflecting areas overlapping at least partially.

79. The imaging system according to claim 78, wherein the multiply reflecting mirror has a planar reflecting surface.

80. The imaging system according to claim 78, wherein the multiply reflecting mirror has a concave reflecting surface.

81. The imaging system according to claim 78, wherein the mirror group is a purely reflective mirror group.

85. The imaging system according to claim 78, wherein the mirror group includes at least one mirror pair consisting of two concave mirrors having mirror surfaces sharing a common surface of curvature provided on a common mirror substrate having a transmissive portion provided between the concave mirrors of the mirror pair.

86. The imaging system according to claim 85, wherein the transmissive portion is at least one of arranged eccentrically to the optical axis and formed by a hole in a mirror substrate.

87. The imaging system according to claim 78, wherein the mirror group has a number of mirrors which is less than the number of reflections within the mirror group.

88. The imaging system according to claim 78, wherein the mirror group includes an object side concave mirror having a mirror surface facing the image side and an image side concave mirror having a mirror surface facing the object side, the object side concave mirror and the image side concave mirror sharing a common mirror axis and being arranged eccentrically to the optical axis such that the mirror group entry is positioned besides the object side concave mirror and the mirror group exit is positioned besides the image side concave mirror on the same side as the mirror group entry, the concave mirrors being arranged such that radiation entering the mirror group obliquely to the optical axis at the mirror group entry is reflected twice on the object side concave mirror and twice on the image side concave mirror prior to exiting the mirror group at the mirror group exit.

89. The imaging system according to claim 78, wherein the mirror group has only two concave mirrors, each concave mirror being arranged to be used as a multiply reflecting mirror such that four reflections within the mirror group are effected with only two concave mirrors.

90. The imaging system according to claim 78, wherein at least one mirror of the mirror group is constructed as a front face mirror having a mirror substrate and a reflective coating on the mirror substrate, wherein a reflection occurs on the coating side opposite to the substrate.

91. The imaging system according to claim 78, wherein a front field surface of the imaging system is positioned in the vicinity of the mirror group entry and a rear field surface of the imaging system is disposed in the vicinity of the mirror group exit and at least one pupil surface of the imaging system is disposed optically between the mirror group entry and the mirror group exit.

92. The imaging system according to claim 91, wherein the mirror group is arranged close to the object surface such that the object surface essentially coincides with the mirror group entry.

93. The imaging system according to claim 91, wherein a front relay imaging system is arranged between the object surface and the mirror group such that an image surface of the front relay system essentially coincides with the mirror group entry.

94. The imaging system according to claim 78, wherein a front relay imaging system is arranged between the object surface and the mirror group, the front relay system having a magnification β

in the range of 0.8≦

|β

|≦

1.2.

95. The imaging system according to claim 78, wherein a rear imaging system is arranged between the mirror group and the image plane of the optical system.

96. The imaging system according to claim 95, wherein the rear imaging system is designed as a demagnifying optical system having a high NA image side.

97. The imaging system according to claim 78, wherein the imaging system has a magnification β

in the range of 0.8≦

|β

|≦

1.2 between the object surface and the image surface.

98. The imaging system according to claim 78, wherein all reflecting areas of the mirror group are non-symmetrical with respect to the optical axis.

99. The imaging system according to claim 78, wherein the imaging system has no planar folding mirrors inclined to the optical axis non-orthogonally.

100. The imaging system according to claim 78, wherein the mirror group has no convex mirror.

101. The imaging system according to claim 78, wherein the imaging system has a circular pupil.

102. The imaging system according to claim 78, wherein a length ratio between an axial mirror group length and a total track length of the imaging system is less than 50%, where the mirror group length is the axial distance between a mirror vertex closest to the object surface and a mirror vertex closest to the image surface and the total track length is the axial distance between the object surface and the image surface.

103. The imaging system according to claim 78, designed as a catadioptric projection objective for microlithography.

104. The imaging system according to claim 103, wherein the catadioptric projection objective has an image side numerical aperture NA>

0.9.

105. The imaging system according to claim 103, wherein the catadioptric projection objective is designed as an immersion objective adapted with reference to aberrations such that an image side working distance between a last optical element and the image plane is filled with an immersion medium having a refractive index substantially greater than 1.

106. The imaging system according to claim 103, wherein the catadioptric projection objective is configured for use with ultraviolet light within a wavelength range extending from about 120 nm to about 260 nm.

107. A projection-exposure system for use in microlithography having an illumination system and a catadioptric projection objective, wherein the projection objective includes the imaging system configured according to claim 78.

108. A method for fabricating at least one of semiconductor devices and other types of microdevices, comprising:

providing a mask having a prescribed pattern;

illuminating the mask with ultraviolet light having a prescribed wavelength; and

projecting an image of the pattern onto a photosensitive substrate arranged in the vicinity of the image plane of a projection objective using a catadioptric projection objective including the imaging system according to of claim 78.