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CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

  • US 20080217554A1
  • Filed: 03/05/2008
  • Published: 09/11/2008
  • Est. Priority Date: 03/09/2007
  • Status: Active Grant
First Claim
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1. A charged particle beam writing apparatus, comprising:

  • an irradiation part configured to irradiate a charged particle beam;

    a first shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the charged particle beam;

    a deflection part configured to deflect the charged particle beam that has passed through the first shaping aperture member;

    a second shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the deflected charged particle beam; and

    a stage on which a target workpiece irradiated with the charged particle beam that has passed through the second shaping aperture member is placed.

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