Lithographic apparatus and device manufacturing method

• US 20080218711A1
• Filed: 02/29/2008
• Published: 09/11/2008
• Est. Priority Date: 04/01/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Baselmans, Johannes Jacobus Matheus, Jansen, Hans, Mulkens, Johannes Catharinus Hubertus, Streefkerk, Bob, Mertens, Jeroen Johannes Sophia Maria, Hoogendam, Christiaan Alexander, Donders, Sjoerd Nicolaas Lambertus
• Granted Patent: US 7,834,977 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Abstract

An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

Claims

1-23. -23. (canceled)

24. A lithographic apparatus, comprising:

a substrate table configured to hold a substrate;

a projection system configured to project a patterned beam of radiation onto a target portion of the substrate;

a first liquid supply system configured to at least partially fill a space between a final element of the projection system and the substrate table, with a first liquid;

a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid provided by a second liquid supply system, the second liquid supply system separate from the first liquid supply system and configured to at least partially fill a space between a final element of the measurement system and the substrate table with the second liquid;

wherein at least one of the supply systems is movable along a direction substantially parallel to an optical axis of the corresponding projection system or measurement system.

25. The lithographic apparatus according to claim 24, wherein the at least one of the liquid supply systems is configured to supply a fluid to create a seal between the at least one supply systems and the substrate, and wherein a pressure of the fluid is controllable to move the at least one of the liquid supply systems along the direction substantially parallel to the optical axis of the corresponding projection system or measurement system.

26. The lithographic apparatus according to claim 24, wherein the seal is a gas seal, a hydrostatic seal or a hydrodynamic seal.

27. The lithographic apparatus according to claim 24, further comprising an actuator assembly configured to move the at least one of the liquid supply systems.

28. The lithographic apparatus according to claim 27, wherein the actuator assembly includes a piezoelectric actuator, or a Lorentz motor, or an excenter mechanism, or a linear electrical or magnetic actuator.

29. The lithographic apparatus according to claim 27, wherein the actuator assembly is configured to move the first liquid supply system such that the first liquid supply system remains substantially stationary relative to the projection system during a movement of the projection system.

30. The lithographic apparatus according to claim 27, wherein the actuator assembly is configured to couple the at least one of the liquid supply systems to a base frame of the lithographic apparatus.

31. The lithographic apparatus according to claim 27, wherein the actuator assembly is configured to couple the at least one of the liquid supply systems to a reference frame that supports the projection system.

32. The lithographic apparatus according to claim 27, further comprising a control system configured to control the actuator assembly.

33. The lithographic apparatus according to claim 32, wherein the control system is configured to actuate the actuator assembly so as to position the at least one of the liquid supply systems at a distance of about several hundred microns from the substrate.

34. The lithographic apparatus according to claim 27, wherein the control system includes a feedforward or feedback control system.

35. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate through a first liquid supplied between the substrate and the projection system with a first liquid supply system, the first liquid supply system configured to at least partially fill a space between the substrate and a final element of a projection system;

measuring a location of each of a plurality of points on the substrate through a second liquid provided by a second liquid supply system, the second liquid supply system separate from the first liquid supply system and configured to at least partially fill a space between a final element of a measurement system and the substrate with the second liquid; and

moving at least one of the supply systems along a direction substantially parallel to an optical axis of the corresponding projection system or measurement system.

36. The method according to claim 35, comprising supplying a fluid to create a seal between the at least one supply systems and the substrate, and controlling a pressure of the fluid to move the at least one of the liquid supply systems along the direction substantially parallel to the optical axis of the corresponding projection system or measurement system.

37. The method according to claim 35, wherein the seal is a gas seal, a hydrostatic seal or a hydrodynamic seal.

38. The method according to claim 35, wherein the at least one of the liquid supply systems is moved using an actuator assembly.

39. The method according to claim 38, wherein the actuator assembly includes a piezoelectric actuator, or a Lorentz motor, or an excenter mechanism, or a linear electrical or magnetic actuator.

40. The method according to claim 38, comprising moving the first liquid supply system such that the first liquid supply system remains substantially stationary relative to the projection system during a movement of the projection system.

41. The method according to claim 38, wherein the actuator assembly is configured to couple the at least one of the liquid supply systems to a reference frame that supports the projection system.

42. The method according to claim 38, further comprising actuating the actuator assembly so as to position the at least one of the liquid supply systems at a distance of about several hundred microns from the substrate.

43. The method according to claim 38, comprising controlling the actuator assembly using a feedforward or feedback control system.