Lithographic apparatus and device manufacturing method

• US 20080218718A1
• Filed: 05/01/2008
• Published: 09/11/2008
• Est. Priority Date: 05/30/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman, Burghoorn, Jacobus, Gui, Cheng-Qun, Van Leeuwen, Robbert Edgar, George, Richard Alexander
• Granted Patent: US 7,576,834 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/53 Automatic registration or positioning of originals with respect to each other or the photosensitive layer
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels
• CPC Class Codes: G03F 9/7003 Alignment type or strategy, e.g. leveling, global alignment
• CPC Class Codes: G03F 9/7026 Focusing

Abstract

A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.

Claims

1. A lithographic apparatus, comprising:

a radiation source configured to provide radiation;

an array of optical light engines, each of the optical light engines comprising;

an array of individually controllable elements arranged and constructed to receive and to pattern the radiation; and

projection optics configured to receive the patterned radiation and to project the patterned radiation onto a substrate; and

a substrate table that supports the substrate;

wherein the substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.

2. The apparatus of claim 1, wherein the substrate table is arranged and constructed to move in a direction perpendicular to the array of optical light engines during exposure of the substrate to the patterned radiation.

3. The apparatus of claim 1, wherein a full width of the substrate is exposed to the patterned radiation in a single pass.

4. The apparatus of claim 1, wherein each of the light engines comprises a microlens array.

5. The apparatus of claim 1, wherein the substrate is a glass substrate.

6. The apparatus of claim 1, wherein the substrate comprises a photosensitive layer.

7. The apparatus of claim 1, wherein the substrate is used to form a flat panel display.

8. A lithographic apparatus, comprising:

a radiation source configured to provide radiation;

an array of optical light engines, each of the optical light engines comprising;

an array of individually controllable elements arranged and constructed to receive and to pattern the radiation; and

projection optics configured to receive the patterned radiation and to project the patterned radiation onto a substrate; and

a substrate table configured to support the substrate;

wherein the array of optical light engines is arranged and constructed to move relative to the substrate table during exposure of the substrate to the patterned radiation.

9. The apparatus of claim 8, wherein a full width of the substrate is exposed to the patterned radiation in a single pass.

10. The apparatus of claim 8, wherein each of the light engines comprises a microlens array.

11. The apparatus of claim 8, wherein the substrate is a glass substrate.

12. The apparatus of claim 8, wherein the substrate comprises a photosensitive layer.

13. The apparatus of claim 8, wherein the substrate is used to form a flat panel display.

14. A device manufacturing method comprising:

(a) illuminating a plurality of arrays of individually controllable elements to generate a plurality of patterned projection beams; and

(b) exposing the full width of a substrate having a photosensitive layer to the plurality of patterned projection beams in a single pass.

15. The method of claim 14, further comprising moving the substrate relative to the plurality of arrays during the exposing.

16. The method of claim 14, further comprising moving the plurality of arrays relative to the substrate during the exposing.

17. The method of claim 14, wherein each of the plurality of patterned beams is projected onto the substrate via a separate optical system.

18. The method of claim 14, wherein each of the plurality of patterned beams is projected onto the substrate via a separate optical system.