Method of producing liquid crystal display device including forming an align mark in an insulating mother substrate

• US 20080220553A1
• Filed: 10/31/2007
• Published: 09/11/2008
• Est. Priority Date: 03/06/2007
• Status: Abandoned Application

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: PARK, Myung-il, KO, Min-jae, LEE, Dong-chin
• Application Number:
  US11/931,206
• Publication Number:
  US 20080220553A1
• Time in Patent Office: Days
• US Class Current: 438/30
• CPC Class Codes: G02F 1/133351 Manufacturing of individual cells out of a plurality of cells, e.g. by dicing

Abstract

A method of producing a liquid crystal display in which elements can be precisely aligned includes: providing an insulating mother substrate; forming an align mark within the insulating mother substrate by irradiating laser light, which has a wavelength less than 355 nm and having an insulating mother substrate absorbance of 10% or greater for the laser light; forming a plurality of elements with reference to the align mark on the insulating mother substrate; and forming a plurality of insulating unit substrates by cutting the insulating mother substrate.

Claims

1. A method of producing a liquid crystal display, the method comprising:

providing an insulating mother substrate;

forming an align mark within the insulating mother substrate by irradiating laser light, the laser light having a wavelength less than 355 nm, and the insulating mother substrate having a laser light absorbance of 10% or greater;

forming a plurality of elements with reference to the align mark on the insulating mother substrate; and

forming a plurality of insulating unit substrates by cutting the insulating mother substrate.

2. The method of claim 1, wherein the laser light is irradiated by using one of an ND:

YAG laser, an Nd;

YLF laser and an Nd;

glass laser.

3. The method of claim 2, wherein the wavelength corresponds to a UV wavelength of 266 nm or less.

4. The method of claim 1, wherein, while the align mark is being formed, the insulating mother substrate is maintained within a temperature range between about 80°

C. and about 400°

C.

5. The method of claim 1, wherein the align mark is formed by focusing the laser light on an interior location of the insulating mother substrate.

6. The method of claim 5, wherein the align mark is formed at a portion located between about ⅓

and about ⅔

of a thickness of the insulating mother substrate.

7. The method of claim 1, wherein the insulating mother substrate comprises a plurality of active regions, on which a plurality of elements are formed, and a dummy region disposed between the active regions, in which the align mark is formed.

8. The method of claim 7, wherein the elements are formed by means of an ink-jet method or a laser projection method.

9. The method of claim 8, wherein the elements comprise gate wiring and data wiring, a black matrix and a color filter pattern, which are sequentially laminated on top of the insulating mother substrate.

10. The method of claim 8, wherein the elements comprise a common electrode formed on top of the insulating mother substrate.

11. A method of producing a liquid crystal display, the method comprising:

providing an insulating mother substrate;

forming at least one align mark within the insulating mother substrate by irradiating pulsed laser light which has a wavelength of 355 nm or greater and a pulse width within a range from 10<sup>−

15</sup> to 10<sup>−

12</sup> second;

forming a plurality of elements on the insulating mother substrate with reference to the align mark; and

forming a plurality of insulating unit substrates by cutting the insulating mother substrate.

12. The method of claim 11, wherein the laser light is irradiated by using a Ti:

Sapphire laser apparatus.

13. The method of claim 12, wherein the wavelength corresponds to an IR wavelength of 800 nm or greater.

14. The method of claim 11, wherein, while the align mark is being formed, the insulating mother substrate is maintained within a temperature range between about 80°

C. and about 400°

C.

15. The method of claim 11, wherein the align mark is formed by focusing the laser light on an interior location of the insulating mother substrate.

16. The method of claim 15, wherein the align mark is formed at a portion located between about ⅓

to about ⅔

of a thickness of the insulating mother substrate, between an upper surface and a lower surface of the insulating mother substrate.

17. The method of claim 11, wherein the insulating mother substrate comprises a plurality of active regions, on which a plurality of elements are formed, and a dummy region disposed between the active regions, in which the align mark is formed.

18. The method of claim 17, wherein the elements are formed by means of an ink-jet method or a laser projection method.

19. The method of claim 18, wherein the elements comprise gate wiring and data wiring, a black matrix and a color filter pattern, which are sequentially laminated on top of the insulating mother substrate.

20. The method of claim 18, wherein the elements comprise a common electrode formed on top of the insulating mother substrate.