Exposure apparatus and method for producing device

• US 20080225249A1
• Filed: 05/16/2008
• Published: 09/18/2008
• Est. Priority Date: 05/23/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi, Mizuno, Yasushi, Tanimoto, Akikazu, Nakano, Katsushi, Kobayashi, Naoyuki, Shiraishi, Kenichi
• Granted Patent: US 8,169,592 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70316 Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
• CPC Class Codes: G03F 9/7015 Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: G03F 9/7096 Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

Abstract

An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.

Claims

1. An exposure apparatus comprising:

an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate;

a member having a surface and movable to a position at which the surface of the member faces the optical element; and

a cleaning system which cleans the surface of the member.

2. The exposure apparatus according to claim 1, wherein the cleaning system cleans the member by removing the exposure liquid remaining on the surface of the member.

3. The exposure apparatus according to claim 2, wherein the cleaning system sucks the exposure liquid remaining on the surface of the member.

4. The exposure apparatus according to claim 2, wherein the cleaning system blows off the exposure liquid remaining on the surface of the member.

5. The exposure apparatus according to claim 1, wherein the cleaning system includes a suction port.

6. The exposure apparatus according to claim 1, wherein the cleaning system supplies a gas to the surface of the member.