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EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

  • US 20080225261A1
  • Filed: 03/07/2008
  • Published: 09/18/2008
  • Est. Priority Date: 03/13/2007
  • Status: Abandoned Application
First Claim
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1. An exposure apparatus that exposes an object with an energy beam and forms a pattern on the object, the apparatus comprising:

  • an object carrier system which carries an object under a reduced-pressure environment;

    an object stage on which a holding device that holds the object is mounted under a reduced-pressure environment; and

    a holding device carrier system which temporarily holds the holding device that holds the object and can receive/pass the object from/to the stage under a reduced-pressure environment.

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