Measurement of Overlay Offset in Semiconductor Processing
First Claim
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1. A method of semiconductor manufacturing, comprising:
- forming an overlay offset measurement target including a first feature located on a first layer and a second feature located on a second layer, wherein the first feature and the second feature have a first predetermined overlay offset;
irradiating the target;
determining a reflectivity of the irradiated target; and
calculating an overlay offset for the first layer and the second layer using the determined reflectivity.
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Abstract
A method of semiconductor manufacturing including forming an overlay offset measurement target including a first feature on a first layer and a second feature on a second layer. The first feature and the second feature have a first predetermined overlay offset. The target is irradiated. The reflectivity of the irradiated target is determined. An overlay offset for the first layer and the second layer is calculated using the determined reflectivity.
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Citations
20 Claims
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1. A method of semiconductor manufacturing, comprising:
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forming an overlay offset measurement target including a first feature located on a first layer and a second feature located on a second layer, wherein the first feature and the second feature have a first predetermined overlay offset; irradiating the target; determining a reflectivity of the irradiated target; and calculating an overlay offset for the first layer and the second layer using the determined reflectivity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A system for overlay offset measurement in semiconductor manufacturing, comprising:
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a radiation source, wherein the radiation source is operable to irradiate an overlay offset measurement target; a detector, wherein the detector is operable to detect reflectivity of the irradiated overlay offset measurement target; and a calculation unit, wherein the calculation unit is operable to determine an overlay offset using the detected reflectivity. - View Dependent Claims (10, 11, 12)
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13. An overlay offset measurement target, comprising:
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a first feature and a second feature having a first predetermined overlay offset; and a third feature and a fourth feature having a second predetermined overlay offset, wherein the first predetermined overlay offset and the second predetermined overlay offset are different. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification