Exposure Apparatus and method for producing device
First Claim
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1. An exposure apparatus comprising:
- an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate;
a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space; and
a cleaning system which cleans the member.
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Abstract
An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
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Citations
6 Claims
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1. An exposure apparatus comprising:
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an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate; a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space; and a cleaning system which cleans the member. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification