UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY
First Claim
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1. A device manufacturing method, comprising:
- applying patterns to a plurality of arrays of individually controllable elements such that they modulate a beam of radiation; and
projecting the modulated beam of radiation onto a substrate,wherein the patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation, the pre-determined amounts of background radiation being different for different locations on the arrays of individually controllable elements.
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Abstract
A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.
28 Citations
20 Claims
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1. A device manufacturing method, comprising:
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applying patterns to a plurality of arrays of individually controllable elements such that they modulate a beam of radiation; and projecting the modulated beam of radiation onto a substrate, wherein the patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation, the pre-determined amounts of background radiation being different for different locations on the arrays of individually controllable elements. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A lithographic apparatus, comprising:
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a plurality of arrays of individually controllable elements arranged to be patterned, such that they modulate a beam of radiation; a projection system arranged to project the modulated beam of radiation onto a substrate; and a controller arranged to control patterns provided on the arrays of individually controllable elements, wherein; the controller is arranged to apply patterns to the arrays of individually controllable elements, the patterns being configured such that pre-determined amounts of background radiation are included in the beam of radiation as modulated by the arrays of individually controllable elements, and the pre-determined amounts of background radiation being different for different locations on the arrays of individually controllable elements. - View Dependent Claims (11, 12, 13, 14)
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15. A device manufacturing method, comprising:
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modulating a beam of radiation using a plurality of arrays of individually controllable elements; and projecting the modulated beam of radiation onto a substrate to form a plurality of patterned regions on the substrate, wherein positions of the patterned regions are staggered, such that there are no locations on the substrate that receive more than three patterned regions. - View Dependent Claims (16)
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17. A lithographic apparatus, comprising:
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a plurality of arrays of individually controllable elements arranged to be patterned, such that they modulate a beam of radiation; a projection system arranged to project the modulated beam of radiation onto a substrate; and a controller arranged to control patterns provided on the arrays of individually controllable elements, wherein the arrays of individually controllable elements are not aligned in a direction transverse to a scanning direction of the lithographic apparatus, but instead have a separation in the scanning direction, the separation being a non-integer multiple of a length of an active part of one of the arrays of individually controllable elements in the scanning direction. - View Dependent Claims (18, 19, 20)
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Specification