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UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY

  • US 20080231826A1
  • Filed: 03/22/2007
  • Published: 09/25/2008
  • Est. Priority Date: 03/22/2007
  • Status: Active Grant
First Claim
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1. A device manufacturing method, comprising:

  • applying patterns to a plurality of arrays of individually controllable elements such that they modulate a beam of radiation; and

    projecting the modulated beam of radiation onto a substrate,wherein the patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation, the pre-determined amounts of background radiation being different for different locations on the arrays of individually controllable elements.

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