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Automated process control using optical metrology with a photonic nanojet

  • US 20080231863A1
  • Filed: 03/20/2007
  • Published: 09/25/2008
  • Est. Priority Date: 03/20/2007
  • Status: Active Grant
First Claim
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1. A method of controlling a fabrication cluster using optical metrology, the method comprising:

  • performing a fabricating process on a wafer using a first fabrication cluster;

    generating a photonic nanojet, wherein the photonic nanojet is an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere;

    scanning an inspection area on the wafer with the photonic nanojet;

    obtaining a measurement of retroreflected light from the dielectric microsphere as the inspection area is scanned with the photonic nanojet;

    determining the existence of a structure in the inspection area with the obtained measurement of the retroreflected light; and

    adjusting one or more process parameters of the first fabrication cluster based on the determination of the existence of the structure in the inspection area.

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