Automated process control using optical metrology with a photonic nanojet
First Claim
1. A method of controlling a fabrication cluster using optical metrology, the method comprising:
- performing a fabricating process on a wafer using a first fabrication cluster;
generating a photonic nanojet, wherein the photonic nanojet is an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere;
scanning an inspection area on the wafer with the photonic nanojet;
obtaining a measurement of retroreflected light from the dielectric microsphere as the inspection area is scanned with the photonic nanojet;
determining the existence of a structure in the inspection area with the obtained measurement of the retroreflected light; and
adjusting one or more process parameters of the first fabrication cluster based on the determination of the existence of the structure in the inspection area.
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Accused Products
Abstract
A fabrication cluster can be controlled using optical metrology. A fabrication process is performed on a wafer using a fabrication cluster. A photonic nanojet, an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere, is generated. An inspection area on the wafer is scanned with the photonic nanojet. A measurement is obtained of the retroreflected light from the dielectric microsphere as the photonic nanojet scans the inspection area. The existence of a structure in the inspection area is determined with the obtained measurement of the retroreflected light. One or more process parameters of the fabrication cluster is adjusted based on the determination of the existence of the structure in the inspection area.
43 Citations
32 Claims
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1. A method of controlling a fabrication cluster using optical metrology, the method comprising:
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performing a fabricating process on a wafer using a first fabrication cluster; generating a photonic nanojet, wherein the photonic nanojet is an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere; scanning an inspection area on the wafer with the photonic nanojet; obtaining a measurement of retroreflected light from the dielectric microsphere as the inspection area is scanned with the photonic nanojet; determining the existence of a structure in the inspection area with the obtained measurement of the retroreflected light; and adjusting one or more process parameters of the first fabrication cluster based on the determination of the existence of the structure in the inspection area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A computer-readable storage medium containing computer executable instructions for causing a computer to control a fabrication cluster using optical metrology, comprising instructions for:
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obtaining a measurement of retroreflected light from a dielectric microsphere as an inspection area on a wafer is scanned with a photonic nanojet, wherein the photonic nanojet is an optical intensity pattern induced at a shadow-side surface of the dielectric microsphere, and wherein a fabrication process was performed on the wafer using a first fabrication cluster; determining the existence of a structure in the inspection area with the obtained measurement of the retroreflected light; and adjusting one or more process parameters of the first fabrication cluster based on the determination of the existence of the structure in the inspection area. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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21. A system for controlling a fabrication cluster using optical metrology, the system comprising:
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a first fabrication cluster configured to perform a fabrication process on a wafer; a photonic nanojet metrology system comprising; an optical source; an optical fiber; an optical lens coupled to a proximal end of the optical fiber; a dielectric microsphere coupled to a distal end of the optical fiber, wherein a photonic nanojet is generated as an optical intensity pattern induced at a shadow-side surface of the dielectric microsphere; a detector connected to the optical fiber, wherein the detector is configured to obtain a measurement of retroreflected light from the dielectric microsphere; and a processor connected to the detector, wherein the processor is configured to determine the existence of a structure in the inspection area with the obtained measurement of the retroreflected light; and a metrology processor connected to the first fabrication cluster and the photonic nanojet metrology system, wherein the metrology processor is configured to adjust one or more process parameters of the first fabrication cluster based on the determination of the existence of the structure in the inspection area. - View Dependent Claims (22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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Specification