THREE DIMENSIONAL NAND MEMORY
First Claim
1. A monolithic, three dimensional NAND string comprising at least a first memory cell located over a second memory cell, wherein a semiconductor active region of the first memory cell is formed epitaxially on a semiconductor active region of the second memory cell, such that a defined boundary exists between the semiconductor active region of the first memory cell and the semiconductor active region of the second memory cell.
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Abstract
A monolithic, three dimensional NAND string includes a first memory cell located over a second memory cell. A semiconductor active region of the first memory cell is formed epitaxially on a semiconductor active region of the second memory cell, such that a defined boundary exists between the semiconductor active region of the first memory cell and the semiconductor active region of the second memory cell.
42 Citations
25 Claims
- 1. A monolithic, three dimensional NAND string comprising at least a first memory cell located over a second memory cell, wherein a semiconductor active region of the first memory cell is formed epitaxially on a semiconductor active region of the second memory cell, such that a defined boundary exists between the semiconductor active region of the first memory cell and the semiconductor active region of the second memory cell.
- 8. A monolithic, three dimensional NAND string comprising at least a first memory cell located over a second memory cell, wherein a semiconductor active region of at least the first memory cell comprises recrystallized polysilicon.
- 15. A monolithic, three dimensional NAND string comprising at least a first memory cell located over a second memory cell, wherein at least one region of the NAND string is planarized.
- 24. A monolithic, three dimensional NAND device, comprising at least a first NAND device level located over a second NAND device level, wherein a semiconductor layer of the first NAND device level is formed epitaxially over a semiconductor layer of the second NAND device level, such that a defined boundary exists between the semiconductor layer of the first NAND device level and the semiconductor layer of the second NAND device level.
Specification