Substrate for Transparent Electrodes

• US 20080237760A1
• Filed: 05/01/2008
• Published: 10/02/2008
• Est. Priority Date: 02/26/2002
• Status: Active Grant

• Current Assignee: Fujikura Limited
• Original Assignee: Fujikura Limited
• Inventors: Kawashima, Takuya, Matsui, Hiroshi, Okada, Kenichi, Tanabe, Nubuo
• Granted Patent: US 8,133,807 B2
• Time in Patent Office: Days
• US Class Current: 257/431
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3452 comprising a fluoride
• CPC Class Codes: H01G 9/2031 comprising titanium oxide, e.g. TiO2 H01G9/2036 takes precedence
• CPC Class Codes: H01L 31/1884 Manufacture of transparent electrodes, e.g. TCO, ITO
• CPC Class Codes: H10K 30/82 Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
• CPC Class Codes: H10K 77/10 Substrates, e.g. flexible substrates
• CPC Class Codes: Y02E 10/542 Dye sensitized solar cells
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product
• CPC Class Codes: Y10T 428/24355 Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/24364 with transparent or protective coating
• CPC Class Codes: Y10T 428/2438 Coated
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree

Abstract

One object of the present invention is to provide a transparent electrode substrate with an ITO film formed thereon, used for example as the transparent electrode plate in a dye sensitized solar cell, for which the electrical resistance does not increase even when exposed to high temperatures of 300° C. or higher. In order to achieve the object, the present invention provides a substrate for a transparent electrode, wherein two or more layers of different transparent conductive films are formed on a transparent substrate, and an upper layer transparent conductive film has a higher heat resistance than that of a lower layer transparent conductive film.

Claims

1-12. -12. (canceled)

13. A method of producing a substrate for a transparent electrode, comprising forming an indium tin oxide film on a transparent substrate at 280°

C. or higher by means of a spray pyrolysis deposition method and forming a fluorine doped tin oxide film on the indium tin oxide film.

14. A method of producing a substrate for a transparent electrode, comprising forming an indium tin oxide film on a transparent substrate by means of a spray pyrolysis deposition method and forming a fluorine doped tin oxide film on the indium tin oxide film at a temperature of about 360 to about 440°

C.