EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
0 Assignments
0 Petitions
Accused Products
Abstract
There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
-
Citations
82 Claims
-
1-33. -33. (canceled)
-
34. A method for preventing or reducing contamination of an immersion type projection apparatus, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising:
- rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
- View Dependent Claims (35, 36, 37, 38, 39, 40, 41, 42, 43, 44)
-
45. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion system configured to at least partially fill an immersion space of the apparatus with a liquid, the method comprising:
- moving at least one of the immersion system and at least part of the apparatus relative to each other; and
rinsing said at least part of the apparatus with the liquid before the apparatus is used to project a patterned beam of radiation onto a target portion of a substrate. - View Dependent Claims (46, 47, 48, 49)
- moving at least one of the immersion system and at least part of the apparatus relative to each other; and
-
50. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including an immersion space, the method comprising:
- filling at least part of the immersion space with a rinsing liquid for at least one minute.
- View Dependent Claims (51)
-
52. A method for preventing or reducing contamination of a lithographic projection apparatus, the apparatus including a substrate holder constructed to hold a substrate, a patterning device holder constructed to hold a patterning device, a projection system, and an immersion space, the method comprising:
- filling at least part of the immersion space with a rinsing liquid during an idle time of the apparatus to prevent or reduce substrate contamination during at least one subsequent start-up run of the apparatus.
- View Dependent Claims (53)
-
54. An immersion type lithographic apparatus comprising:
- at least one immersion space; and
an immersion system configured to at least partially fill the immersion space with a liquid, wherein the apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate. - View Dependent Claims (55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77)
- at least one immersion space; and
-
78. An immersion type lithographic apparatus, including at least one storage space or compartment to store at least one dummy substrate or substrate-shaped object in-situ.
-
79. An immersion type lithographic apparatus, including at least one storage space or compartment to store at least one dummy patterning device or patterning device-shaped object in-situ.
-
80. A computer program containing one or more sequences of machine-readable instructions configured to carry out a method for preventing or reducing contamination of an immersion type projection apparatus when the computer program is being executed by a computer, the apparatus comprising at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate, the method comprising rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
-
81. A method for preventing or reducing contamination of a lithographic projection apparatus comprising a space that is to be provided with a liquid through which a beam of radiation can be transmitted, the method comprising:
- operating the lithographic apparatus; and
subsequently rinsing at least part of the space with a rinsing liquid. - View Dependent Claims (82)
- operating the lithographic apparatus; and
Specification