PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
First Claim
Patent Images
1. A projection objective, comprising:
- a manipulator configured to reduce rotationally asymmetric image errors, wherein the manipulator comprises;
a) a first optical element of a refractive type,b) a second optical element,c) an interspace formed between the first optical element and the second optical element,d) a liquid filling the interspace, ande) an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element,wherein the projection objective is designed to be used in microlithographic projection exposure apparatus.
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Abstract
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
81 Citations
51 Claims
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1. A projection objective, comprising:
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a manipulator configured to reduce rotationally asymmetric image errors, wherein the manipulator comprises; a) a first optical element of a refractive type, b) a second optical element, c) an interspace formed between the first optical element and the second optical element, d) a liquid filling the interspace, and e) an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element, wherein the projection objective is designed to be used in microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 44, 45, 46, 47, 48, 49)
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5. (canceled)
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6. (canceled)
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42. A projection objective, comprising:
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a manipulator configured to reduce image errors, wherein the manipulator comprises; a) a deformable optical element of a refractive type and b) an actuator coupled to the optical element such that operation of the actuator causes a deformation of the optical element, wherein the actuator is fastened to a front or a rear surface of the optical element, the actuator is configured to produce on the optical element compressive and/or tensile forces along directions that are at least substantially tangential to the surface, and the projection objective is configured to be used in a microlithographic projection exposure apparatus.
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43. A projection, comprising:
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a manipulator configured to reduce image errors, wherein the manipulator comprises; a) a first optical element of a refractive type, wherein the first optical element has a thickness distribution in its undeformed state which is rotationally asymmetric, b) a second optical element, c) an interspace formed between the first optical element and the second optical element, d) a fluid filling the interspace, and e) means for deforming the first optical element, wherein the projection objective is configured to be used in a microlithographic projection exposure apparatus.
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50. An objective, comprising:
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a manipulator configured to reduce rotationally asymmetric image errors, wherein the manipulator comprises; a) a first optical element of a refractive type, b) a second optical element c) an interspace between the first optical element and the second optical element, d) a liquid filling the interspace, and e) an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element, wherein the ratio between the refractive index of the first optical element and the refractive index of the liquid is between 0.9 and 1.1. - View Dependent Claims (51)
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Specification