PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

• US 20080239503A1
• Filed: 01/09/2008
• Published: 10/02/2008
• Est. Priority Date: 07/25/2005
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Hauf, Markus, Holderer, Hubert, Bittner, Boris, Kazi, Arif, Weber, Jochen, Conradi, Olaf, Hummel, Wolfgang, Tayebati, Payam, Bleidistel, Sascha, Schwaer, Baerbel
• Granted Patent: US 7,830,611 B2
• Time in Patent Office: Days
• US Class Current: 359/666
• CPC Class Codes: G02B 27/0068 having means for controlling the degree of correction, e.g. using phase modulators, movable elements controlling the phase of light using moving or deformable elements G02B26/06
• CPC Class Codes: G02B 3/14 of variable focal length
• CPC Class Codes: G03F 7/70266 Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707

Abstract

A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Claims

1. A projection objective, comprising:

a manipulator configured to reduce rotationally asymmetric image errors, wherein the manipulator comprises;

a) a first optical element of a refractive type,

b) a second optical element,

c) an interspace formed between the first optical element and the second optical element,

d) a liquid filling the interspace, and

e) an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element,

wherein the projection objective is designed to be used in microlithographic projection exposure apparatus.

2. A projection objective according to claim 1, wherein the first optical element is a plane-parallel plate.

3. A projection objective according to claim 1, wherein the first optical element is a meniscus lens.

4. A projection objective according to claim 1, wherein the first optical element is a membrane.

7. A projection objective according to claim 1, wherein the interspace has, in a direction along an optical axis of the projection objective, a maximum thickness of less than 1 mm.

8. A projection objective according to claim 7, wherein the maximum thickness is less than 2 μ

m.

9. A projection objective according to claim 1, wherein the deformation of the first optical element has an m-fold symmetry or a superposition of a plurality of m-fold symmetries with m being an even, positive integer.

10. A projection objective according to claim 1, comprising at least two actuators that are configured to exert bending moments on the first optical element.

11. A projection objective according to claim 10, wherein the at least two actuators are arranged along a circumference of the first optical element.

12. A projection objective according to claim 10, wherein the actuators are configured such that at least two deformations of the first optical element can be generated having a different m-fold symmetry.

13. A projection objective according to claim 1, wherein the second optical element is of a reflective type.

14. A projection objective according to claim 1, wherein the second optical element is of a refractive type.

15. A projection objective according to claim 14, wherein the second optical element is a meniscus lens or a plane-parallel plate.

16. A projection objective according to claim 1, comprising a second actuator configured to act exclusively on the second optical element to generate a deformation of the second optical element.

17. A projection objective according to claim 16, wherein the deformation of the second optical element is rotationally asymmetric.

18. A projection objective according to claim 16, wherein the deformation of the second optical element is rotationally symmetric.

19. A projection objective according to any of the preceding claim 1, comprising a pressure equalizer configured to maintain a constant pressure of the liquid in the immersion space.

20. A projection objective according to claim 1, wherein the first optical element is arranged in or in close proximity of a pupil plane.

21. A projection objective according to claim 1, wherein the actuator is fastened to a front or a rear surface of the first optical element, and wherein the actuator is configured to produce on the first optical element compressive and/or tensile forces along directions that are at least substantially tangential to the surface.

22. A projection objective according to claim 21, wherein the actuator is formed by a layer which is applied to the surface, the layer having a variable dimension along at least one direction.

23. A projection objective according to claim 22, wherein the layer is comprises a piezo electric material.

24. A projection objective according to claim 22, wherein the layer is comprises a material having a coefficient of thermal expansion that is different from the coefficient of thermal expansion of the first optical element.

25. A projection objective according to claim 24, comprising a device configured to controllably change the temperature of the layer.

26. A projection objective according of claim 25, wherein the device is configured to direct radiation onto the layer.

27. A projection objective according of claim 25, wherein the device is configured to apply a voltage to the layer.

28. A projection objective according to claim 22, wherein a plurality of layers have the shape of ring segments, the ring segments forming a circular ring which is centered with respect to an optical axis of the projection objective.

29. A projection objective according to claim 28, wherein the ring segments are spaced apart by gaps.

30. A projection objective according to claim 21, wherein a plurality of actuators are distributed over the surface within an area through which projection light propagates.

31. A projection objective according to claim 30, wherein the plurality of actuators are at least substantially transparent at the wavelengths of the projection light.

32. A projection objective according to claim 30, wherein the plurality of actuators are opaque at the wavelengths of the projection light, and wherein the manipulator is arranged in or in close proximity to a pupil plane of the projection objective.

33. A projection objective according to claim 1, comprising a sensor that is fastened to a front or rear surface of the first optical element, wherein the sensor is configured to measure a deformation of the first optical element produced by the actuator.

34. A projection objective according to claim 33, wherein the sensor is configured to produce an output signal which depends on the amount of compressive and/or tensile forces produced in the sensor by a deformation of the first optical element.

35. A projection objective according to claim 1, wherein a plurality of actuators are distributed over an area, through which projection light is allowed to propagate, of a surface of the first optical elements which is opposite to a surface which is in contact with the liquid.

36. A projection objective according to claim 35, comprising a further optical element of a refractive type on which the plurality of actuators rest.

37. A projection objective according to claim 1, comprising:

a) a further interspace formed between the second optical element and a third optical element, wherein both the second optical element and the third optical element are of a refractive type, and

b) means for deforming the third optical element.

38. A projection objective according to claim 1, comprising a device for changing configured to change the pressure of the liquid.

39. A projection objective according to claim 1, wherein the first optical element has a shape in its undeformed state which is rotationally asymmetric.

40. A projection objective according to claim 39, wherein the first optical element has a thickness distribution in its undeformed state which is rotationally asymmetric.

41. A projection objective according to claim 40, wherein the first optical element has a first surface, which is in contact to the liquid and has a rotationally asymmetric shape, and a second surface opposite the first surface, wherein the second surface has a rotationally symmetric shape.

44. A projection exposure apparatus, comprising a projection objective according to claim 1.

45. A projection exposure apparatus according to claim 44 comprising:

a) a controller configured to drive the at least one actuator,

b) a sensor arrangement connected to the controller in order to determine the image errors.

46. A projection exposure apparatus according to claim 45, wherein the sensor arrangement comprises a CCD sensor, which is positionable in an image plane of the projection objective or in a field plane conjugate therewith.

47. A projection exposure apparatus according to claim 45, wherein the manipulator, the controller and the sensor arrangement form a closed feedback loop.

48. A method, comprising:

using a projection exposure apparatus according to claim 44;

to produce a microstructured component.

49. A method according to claim 48, comprising:

b) arranging a mask in an object plane of the projection objective; and

c) projecting the mask onto a photosensitive layer which is arranged in an image plane of the projection objective

5. (canceled)

6. (canceled)

42. A projection objective, comprising:

a manipulator configured to reduce image errors, wherein the manipulator comprises;

a) a deformable optical element of a refractive type and

b) an actuator coupled to the optical element such that operation of the actuator causes a deformation of the optical element,

wherein

the actuator is fastened to a front or a rear surface of the optical element,

the actuator is configured to produce on the optical element compressive and/or tensile forces along directions that are at least substantially tangential to the surface, and

the projection objective is configured to be used in a microlithographic projection exposure apparatus.

43. A projection, comprising:

a manipulator configured to reduce image errors, wherein the manipulator comprises;

a) a first optical element of a refractive type, wherein the first optical element has a thickness distribution in its undeformed state which is rotationally asymmetric,

b) a second optical element,

c) an interspace formed between the first optical element and the second optical element,

d) a fluid filling the interspace, and

e) means for deforming the first optical element,

wherein the projection objective is configured to be used in a microlithographic projection exposure apparatus.

50. An objective, comprising:

a manipulator configured to reduce rotationally asymmetric image errors, wherein the manipulator comprises;

a) a first optical element of a refractive type,

b) a second optical element

c) an interspace between the first optical element and the second optical element,

d) a liquid filling the interspace, and

e) an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element,

wherein the ratio between the refractive index of the first optical element and the refractive index of the liquid is between 0.9 and 1.1.

51. A projection objective according to claim 50, wherein the ratio between the refractive index of the first optical element and the refractive index of the liquid is between 0.99 and 1.01.